Abstract
A novel ferromagnetic tunnel junction with transition metal oxides has been fabricated with photo-lithographic technique. Well defined tunneling properties were observed in a novel barrier material of TiOx with the thickness down to 2 nm. Spin dependent transport properties have been confirmed for Fe3O4/ TiOx/M (M = Co, Co/NiFe, NiFe) tunnel junctions, where highest magneto-resistance (MR) change of 7% was observed for Co. Drastic improvement of field sensitivity was attained with the exchange coupled Co/ NiFe bi-layer.
| Original language | English |
|---|---|
| Pages (from-to) | 63-66 |
| Number of pages | 4 |
| Journal | Research Reports on Information Science and Electrical Engineering of Kyushu University |
| Volume | 10 |
| Issue number | 1 |
| Publication status | Published - 2005 Mar 1 |
| Externally published | Yes |
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Keywords
- Ferromagnetic tunnel junction
- Spin dependent transport
- Transition metal oxide
ASJC Scopus subject areas
- Computer Science(all)
- Electrical and Electronic Engineering
Cite this
Qin, F., Nozaki, Y., & Matsuyama, K. (2005). Fabrication and characterization of ferromagnetic tunnel junction with transition metal oxides. Research Reports on Information Science and Electrical Engineering of Kyushu University, 10(1), 63-66.