Fabrication and electrochemical properties of boron-doped SiC

Research output: Contribution to journalArticlepeer-review

Abstract

Silicon carbide (SiC) has excellent properties such as chemical and physical stability, biocompatibility, and high thermal conductivity. However, electrical conductivity of SiC is not high enough for electrochemical applications, which has been a major challenge. Here, in order to improve the conductivity, we prepared boron-doped SiC (SiC:B) and evaluated the electrochemical properties. SiC and SiC:B were fabricated by a microwave plasma chemical vapor deposition method. Structural characterization revealed that the main phase of SiC:B is 3C–SiC where the concentration of doped boron could be controlled by tuning the growth conditions. Electrochemical properties were evaluated by cyclic voltammetry measurements, indicating that the reactivity and sensitivity of the SiC:B electrode was comparable of that of the glassy carbon electrode.

Original languageEnglish
Pages (from-to)240-247
Number of pages8
JournalCarbon
Volume174
DOIs
Publication statusPublished - 2021 Apr 15

Keywords

  • Chemical vapor deposition
  • Electrochemical property
  • Electrode
  • Silicon carbide

ASJC Scopus subject areas

  • Chemistry(all)
  • Materials Science(all)

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