Intensive ion source for single-size nanoclusters was developed on the basis of high-power impulse magnetron sputtering (HiPIMS) technique combined with a low-pressure, low-temperature gas flow reactor. The nanocluster source exhibits superior characteristics originating from pulsed, high-power sputtering compared to conventional direct-current sputtering; (1) enhanced ion intensities, (2) fascicle tuning of nanocluster sizes, and (3) enhanced selectivity of stable, magic nanoclusters. The metallic (silver, platinum, and palladium) and binary (transition-metal and silicon) nanocluster ions in the size range of several to one hundred atoms can be generated with ion current of 100 pA to 10 nA (108 to 1011 nanoclusters/sec). The growth mechanism of nanoclusters in the source was also explained by the nucleation theory.
|Number of pages||10|
|Journal||Journal of the Vacuum Society of Japan|
|Publication status||Published - 2017|
ASJC Scopus subject areas
- Materials Science(all)
- Surfaces and Interfaces