Fabrication method for nanocluster superatoms with high-power impulse magnetron sputtering

Hironori Tsunoyama, Masahide Tona, Keizo Tsukamoto, Atsushi Nakajima

Research output: Contribution to journalReview article

Abstract

Intensive ion source for single-size nanoclusters was developed on the basis of high-power impulse magnetron sputtering (HiPIMS) technique combined with a low-pressure, low-temperature gas flow reactor. The nanocluster source exhibits superior characteristics originating from pulsed, high-power sputtering compared to conventional direct-current sputtering; (1) enhanced ion intensities, (2) fascicle tuning of nanocluster sizes, and (3) enhanced selectivity of stable, magic nanoclusters. The metallic (silver, platinum, and palladium) and binary (transition-metal and silicon) nanocluster ions in the size range of several to one hundred atoms can be generated with ion current of 100 pA to 10 nA (108 to 1011 nanoclusters/sec). The growth mechanism of nanoclusters in the source was also explained by the nucleation theory.

Original languageEnglish
Pages (from-to)352-361
Number of pages10
JournalJournal of the Vacuum Society of Japan
Volume60
Issue number9
Publication statusPublished - 2017

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ASJC Scopus subject areas

  • Materials Science(all)
  • Instrumentation
  • Surfaces and Interfaces
  • Spectroscopy

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