Fabrication of boron doped diamond chip electrodes for single drop analysis

Ai Sugitani, Michinobu Katayama, Takeshi Watanabe, Yoshinori Matsumoto, Yasuaki Einaga

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

As a prototype for a "highly sensitive electrochemical detection system for single drop analysis using boron-doped diamond (BDD) electrodes", a three-electrode system for the measurement of samples consisting of a single drop was fabricated. An Inductively Coupled Plasma Reactive Ion Etching (ICP-RIE) system, employing the Bosch process in order to realize high-aspect-ratio near vertical structures, was used to etch the BDD. A single drop (10 μL) was analyzed using the resulting fabricated 'BDD chip electrode' which exhibited the typical superior electrochemical properties of BDD electrodes.

Original languageEnglish
Pages (from-to)25636-25639
Number of pages4
JournalRSC Advances
Volume3
Issue number48
DOIs
Publication statusPublished - 2013 Dec 28

Fingerprint

Diamond
Boron
Diamonds
Fabrication
Electrodes
Plasma etching
Reactive ion etching
Inductively coupled plasma
Electrochemical properties
Aspect ratio

ASJC Scopus subject areas

  • Chemical Engineering(all)
  • Chemistry(all)

Cite this

Fabrication of boron doped diamond chip electrodes for single drop analysis. / Sugitani, Ai; Katayama, Michinobu; Watanabe, Takeshi; Matsumoto, Yoshinori; Einaga, Yasuaki.

In: RSC Advances, Vol. 3, No. 48, 28.12.2013, p. 25636-25639.

Research output: Contribution to journalArticle

Sugitani, Ai ; Katayama, Michinobu ; Watanabe, Takeshi ; Matsumoto, Yoshinori ; Einaga, Yasuaki. / Fabrication of boron doped diamond chip electrodes for single drop analysis. In: RSC Advances. 2013 ; Vol. 3, No. 48. pp. 25636-25639.
@article{be2cb167a48443308126d0724ddf1afc,
title = "Fabrication of boron doped diamond chip electrodes for single drop analysis",
abstract = "As a prototype for a {"}highly sensitive electrochemical detection system for single drop analysis using boron-doped diamond (BDD) electrodes{"}, a three-electrode system for the measurement of samples consisting of a single drop was fabricated. An Inductively Coupled Plasma Reactive Ion Etching (ICP-RIE) system, employing the Bosch process in order to realize high-aspect-ratio near vertical structures, was used to etch the BDD. A single drop (10 μL) was analyzed using the resulting fabricated 'BDD chip electrode' which exhibited the typical superior electrochemical properties of BDD electrodes.",
author = "Ai Sugitani and Michinobu Katayama and Takeshi Watanabe and Yoshinori Matsumoto and Yasuaki Einaga",
year = "2013",
month = "12",
day = "28",
doi = "10.1039/c3ra44090g",
language = "English",
volume = "3",
pages = "25636--25639",
journal = "RSC Advances",
issn = "2046-2069",
publisher = "Royal Society of Chemistry",
number = "48",

}

TY - JOUR

T1 - Fabrication of boron doped diamond chip electrodes for single drop analysis

AU - Sugitani, Ai

AU - Katayama, Michinobu

AU - Watanabe, Takeshi

AU - Matsumoto, Yoshinori

AU - Einaga, Yasuaki

PY - 2013/12/28

Y1 - 2013/12/28

N2 - As a prototype for a "highly sensitive electrochemical detection system for single drop analysis using boron-doped diamond (BDD) electrodes", a three-electrode system for the measurement of samples consisting of a single drop was fabricated. An Inductively Coupled Plasma Reactive Ion Etching (ICP-RIE) system, employing the Bosch process in order to realize high-aspect-ratio near vertical structures, was used to etch the BDD. A single drop (10 μL) was analyzed using the resulting fabricated 'BDD chip electrode' which exhibited the typical superior electrochemical properties of BDD electrodes.

AB - As a prototype for a "highly sensitive electrochemical detection system for single drop analysis using boron-doped diamond (BDD) electrodes", a three-electrode system for the measurement of samples consisting of a single drop was fabricated. An Inductively Coupled Plasma Reactive Ion Etching (ICP-RIE) system, employing the Bosch process in order to realize high-aspect-ratio near vertical structures, was used to etch the BDD. A single drop (10 μL) was analyzed using the resulting fabricated 'BDD chip electrode' which exhibited the typical superior electrochemical properties of BDD electrodes.

UR - http://www.scopus.com/inward/record.url?scp=84887920820&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84887920820&partnerID=8YFLogxK

U2 - 10.1039/c3ra44090g

DO - 10.1039/c3ra44090g

M3 - Article

VL - 3

SP - 25636

EP - 25639

JO - RSC Advances

JF - RSC Advances

SN - 2046-2069

IS - 48

ER -