Fabrication of boron doped diamond chip electrodes for single drop analysis

Ai Sugitani, Michinobu Katayama, Takeshi Watanabe, Yoshinori Matsumoto, Yasuaki Einaga

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

As a prototype for a "highly sensitive electrochemical detection system for single drop analysis using boron-doped diamond (BDD) electrodes", a three-electrode system for the measurement of samples consisting of a single drop was fabricated. An Inductively Coupled Plasma Reactive Ion Etching (ICP-RIE) system, employing the Bosch process in order to realize high-aspect-ratio near vertical structures, was used to etch the BDD. A single drop (10 μL) was analyzed using the resulting fabricated 'BDD chip electrode' which exhibited the typical superior electrochemical properties of BDD electrodes.

Original languageEnglish
Pages (from-to)25636-25639
Number of pages4
JournalRSC Advances
Volume3
Issue number48
DOIs
Publication statusPublished - 2013 Dec 28

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ASJC Scopus subject areas

  • Chemistry(all)
  • Chemical Engineering(all)

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