Fabrication of valley photonic crystals with CMOS-compatible process

Takuto Yamaguchi, Hironobu Yoshimi, Miyoshi Seki, Minoru Ohtsuka, Nobuyuki Yokoyama, Yasutomo Ota, Makoto Okano, Satoshi Iwamoto

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We demonstrated the fabrication of silicon valley photonic crystal structures with triangular air holes by using photolithography for the first time. The mask patterns we newly designed enable the formation of triangular air holes with reasonably high accuracy. This is an important step toward CMOS-compatible topological nanophotonics.

Original languageEnglish
Title of host publication26th Microoptics Conference, MOC 2021
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9784863487758
DOIs
Publication statusPublished - 2021
Event26th Microoptics Conference, MOC 2021 - Virtual, Online, Japan
Duration: 2021 Sep 262021 Sep 29

Publication series

Name26th Microoptics Conference, MOC 2021

Conference

Conference26th Microoptics Conference, MOC 2021
Country/TerritoryJapan
CityVirtual, Online
Period21/9/2621/9/29

ASJC Scopus subject areas

  • Spectroscopy
  • Energy Engineering and Power Technology
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Instrumentation
  • Atomic and Molecular Physics, and Optics

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