TY - GEN
T1 - Fabrication of valley photonic crystals with CMOS-compatible process
AU - Yamaguchi, Takuto
AU - Yoshimi, Hironobu
AU - Seki, Miyoshi
AU - Ohtsuka, Minoru
AU - Yokoyama, Nobuyuki
AU - Ota, Yasutomo
AU - Okano, Makoto
AU - Iwamoto, Satoshi
N1 - Funding Information:
This work was partially supported by MEXT KAKENHI Grant Number JP15H05700, JP15H05868, JP17H06138, JP20J22862, and New Energy and Industrial Technology Development Organization (NEDO).
Publisher Copyright:
© 2021 Japan Society of Applied Physics.
PY - 2021
Y1 - 2021
N2 - We demonstrated the fabrication of silicon valley photonic crystal structures with triangular air holes by using photolithography for the first time. The mask patterns we newly designed enable the formation of triangular air holes with reasonably high accuracy. This is an important step toward CMOS-compatible topological nanophotonics.
AB - We demonstrated the fabrication of silicon valley photonic crystal structures with triangular air holes by using photolithography for the first time. The mask patterns we newly designed enable the formation of triangular air holes with reasonably high accuracy. This is an important step toward CMOS-compatible topological nanophotonics.
UR - http://www.scopus.com/inward/record.url?scp=85123380548&partnerID=8YFLogxK
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U2 - 10.23919/MOC52031.2021.9598129
DO - 10.23919/MOC52031.2021.9598129
M3 - Conference contribution
AN - SCOPUS:85123380548
T3 - 26th Microoptics Conference, MOC 2021
BT - 26th Microoptics Conference, MOC 2021
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 26th Microoptics Conference, MOC 2021
Y2 - 26 September 2021 through 29 September 2021
ER -