Abstract
Near-field processing technology mediated with nanotemplates enables one to obtain high-throughput nanopatterning with nanoscale size and spacing. The method with nanoparticle templates leads to precise nanohole patterning. This fabrication technology is classified broadly according to particle materials: metallic (plasmonic) particle and dielectric (nonplasmonic) particle. In this paper, we present a comparative study between near-field enhancement with metallic particle and dielectric particle. Following the comparative study, we demonstrate nanoablation using Mie resonance high dielectric constant small particles.
| Original language | English |
|---|---|
| Title of host publication | Proceedings of 2011 1st International Symposium on Access Spaces, ISAS 2011 |
| Pages | 202-207 |
| Number of pages | 6 |
| DOIs | |
| Publication status | Published - 2011 |
| Event | 2011 1st International Symposium on Access Spaces, ISAS 2011 - Yokohama, Japan Duration: 2011 Jun 17 → 2011 Jun 19 |
Other
| Other | 2011 1st International Symposium on Access Spaces, ISAS 2011 |
|---|---|
| Country | Japan |
| City | Yokohama |
| Period | 11/6/17 → 11/6/19 |
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Keywords
- light scattering
- nano-optics
- near-field optics
- plasmonics
- ultrafast laser processing
ASJC Scopus subject areas
- Computer Networks and Communications
- Electrical and Electronic Engineering
Cite this
Femtosecond laser near-field nanoablation with plasmonic and nonplasmonic nanoparticle templates. / Tanaka, Yuto; Terakawa, Mitsuhiro; Obara, Minoru.
Proceedings of 2011 1st International Symposium on Access Spaces, ISAS 2011. 2011. p. 202-207 5960948.Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
}
TY - GEN
T1 - Femtosecond laser near-field nanoablation with plasmonic and nonplasmonic nanoparticle templates
AU - Tanaka, Yuto
AU - Terakawa, Mitsuhiro
AU - Obara, Minoru
PY - 2011
Y1 - 2011
N2 - Near-field processing technology mediated with nanotemplates enables one to obtain high-throughput nanopatterning with nanoscale size and spacing. The method with nanoparticle templates leads to precise nanohole patterning. This fabrication technology is classified broadly according to particle materials: metallic (plasmonic) particle and dielectric (nonplasmonic) particle. In this paper, we present a comparative study between near-field enhancement with metallic particle and dielectric particle. Following the comparative study, we demonstrate nanoablation using Mie resonance high dielectric constant small particles.
AB - Near-field processing technology mediated with nanotemplates enables one to obtain high-throughput nanopatterning with nanoscale size and spacing. The method with nanoparticle templates leads to precise nanohole patterning. This fabrication technology is classified broadly according to particle materials: metallic (plasmonic) particle and dielectric (nonplasmonic) particle. In this paper, we present a comparative study between near-field enhancement with metallic particle and dielectric particle. Following the comparative study, we demonstrate nanoablation using Mie resonance high dielectric constant small particles.
KW - light scattering
KW - nano-optics
KW - near-field optics
KW - plasmonics
KW - ultrafast laser processing
UR - http://www.scopus.com/inward/record.url?scp=80051822812&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=80051822812&partnerID=8YFLogxK
U2 - 10.1109/ISAS.2011.5960948
DO - 10.1109/ISAS.2011.5960948
M3 - Conference contribution
AN - SCOPUS:80051822812
SN - 9781457707179
SP - 202
EP - 207
BT - Proceedings of 2011 1st International Symposium on Access Spaces, ISAS 2011
ER -