Fluorocarbon film for protection from alkaline etchant and elimination of in-use stiction

Yoshinori Matsumoto; Kazumasa Yoshida; Makoto Ishida

Fluorocarbon film for protection from alkaline etchant and elimination of in-use stiction

Yoshinori Matsumoto, Kazumasa Yoshida, Makoto Ishida

Research output: Contribution to conference › Paper › peer-review

Abstract

Several deposition techniques and the characteristics of fluorocarbon (FC) films have been investigated. At first, FC film was spin-coated from Cyclized Perfluoro Polymer (CPFP) commercialized as CYTOP. Because of the excellent durability for alkali or acid, the FC film was used for protection of circuit area of integrated accelerometer during silicon alkaline etching process by 25 wt% TMAH at 90 °C. Second, FC films were formed on a field-free zone with a capacitive coupling type plasma polymerization equipment using perfluorinated liquid (C₇F₁₆,C₈F₁₈ etc.) as monomer species. The deposition rate and thermal stability of the films were investigated. The FC films are effective for elimination of in-use stiction for surface micromachining devices.

Original language	English
Pages	695-698
Number of pages	4
Publication status	Published - 1997 Jan 1
Externally published	Yes
Event	Proceedings of the 1997 International Conference on Solid-State Sensors and Actuators. Part 1 (of 2) - Chicago, IL, USA Duration: 1997 Jun 16 → 1997 Jun 19

Other

Other	Proceedings of the 1997 International Conference on Solid-State Sensors and Actuators. Part 1 (of 2)
City	Chicago, IL, USA
Period	97/6/16 → 97/6/19

ASJC Scopus subject areas

Engineering(all)

Cite this

Fluorocarbon film for protection from alkaline etchant and elimination of in-use stiction. / Matsumoto, Yoshinori; Yoshida, Kazumasa; Ishida, Makoto.
1997. 695-698 Paper presented at Proceedings of the 1997 International Conference on Solid-State Sensors and Actuators. Part 1 (of 2), Chicago, IL, USA.

Research output: Contribution to conference › Paper › peer-review

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abstract = "Several deposition techniques and the characteristics of fluorocarbon (FC) films have been investigated. At first, FC film was spin-coated from Cyclized Perfluoro Polymer (CPFP) commercialized as CYTOP. Because of the excellent durability for alkali or acid, the FC film was used for protection of circuit area of integrated accelerometer during silicon alkaline etching process by 25 wt% TMAH at 90 °C. Second, FC films were formed on a field-free zone with a capacitive coupling type plasma polymerization equipment using perfluorinated liquid (C7F16,C8F18 etc.) as monomer species. The deposition rate and thermal stability of the films were investigated. The FC films are effective for elimination of in-use stiction for surface micromachining devices.",

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T1 - Fluorocarbon film for protection from alkaline etchant and elimination of in-use stiction

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AU - Ishida, Makoto

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N2 - Several deposition techniques and the characteristics of fluorocarbon (FC) films have been investigated. At first, FC film was spin-coated from Cyclized Perfluoro Polymer (CPFP) commercialized as CYTOP. Because of the excellent durability for alkali or acid, the FC film was used for protection of circuit area of integrated accelerometer during silicon alkaline etching process by 25 wt% TMAH at 90 °C. Second, FC films were formed on a field-free zone with a capacitive coupling type plasma polymerization equipment using perfluorinated liquid (C7F16,C8F18 etc.) as monomer species. The deposition rate and thermal stability of the films were investigated. The FC films are effective for elimination of in-use stiction for surface micromachining devices.

AB - Several deposition techniques and the characteristics of fluorocarbon (FC) films have been investigated. At first, FC film was spin-coated from Cyclized Perfluoro Polymer (CPFP) commercialized as CYTOP. Because of the excellent durability for alkali or acid, the FC film was used for protection of circuit area of integrated accelerometer during silicon alkaline etching process by 25 wt% TMAH at 90 °C. Second, FC films were formed on a field-free zone with a capacitive coupling type plasma polymerization equipment using perfluorinated liquid (C7F16,C8F18 etc.) as monomer species. The deposition rate and thermal stability of the films were investigated. The FC films are effective for elimination of in-use stiction for surface micromachining devices.

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Y2 - 16 June 1997 through 19 June 1997

ER -

Fluorocarbon film for protection from alkaline etchant and elimination of in-use stiction

Abstract

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ASJC Scopus subject areas

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