Fluorocarbon film for protection from alkaline etchant and elimination of in-use stiction

Yoshinori Matsumoto, Kazumasa Yoshida, Makoto Ishida

Research output: Contribution to conferencePaperpeer-review

12 Citations (Scopus)

Abstract

Several deposition techniques and the characteristics of fluorocarbon (FC) films have been investigated. At first, FC film was spin-coated from Cyclized Perfluoro Polymer (CPFP) commercialized as CYTOP. Because of the excellent durability for alkali or acid, the FC film was used for protection of circuit area of integrated accelerometer during silicon alkaline etching process by 25 wt% TMAH at 90 °C. Second, FC films were formed on a field-free zone with a capacitive coupling type plasma polymerization equipment using perfluorinated liquid (C7F16,C8F18 etc.) as monomer species. The deposition rate and thermal stability of the films were investigated. The FC films are effective for elimination of in-use stiction for surface micromachining devices.

Original languageEnglish
Pages695-698
Number of pages4
Publication statusPublished - 1997 Jan 1
Externally publishedYes
EventProceedings of the 1997 International Conference on Solid-State Sensors and Actuators. Part 1 (of 2) - Chicago, IL, USA
Duration: 1997 Jun 161997 Jun 19

Other

OtherProceedings of the 1997 International Conference on Solid-State Sensors and Actuators. Part 1 (of 2)
CityChicago, IL, USA
Period97/6/1697/6/19

ASJC Scopus subject areas

  • Engineering(all)

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