Frequency dependence on the structure of radio frequency glow discharges in Ar

Shigeru Kakuta, Toshiaki Makabe, Fumiyoshi Tochikubo

Research output: Contribution to journalArticle

23 Citations (Scopus)

Abstract

The frequency dependence of the sustaining voltage in a radio frequency discharge has been investigated under minimum sustaining and constant power conditions in Ar. In addition to the well-known feature that the sustaining voltage is high at low frequency and low at high frequency, the difference between monoatomic and polyatomic gases is recognized. The phase shift between voltage and current at 1 Torr decreases with increasing frequency above 500 kHz. This results from the electron density modulation having a delay with respect to the applied voltage. The phase shift at high frequency increases with increasing applied voltage, due to the balance of drift and diffusion fluxes of electron. The spatiotemporal net excitation rate of Ar(3p5) was measured at 100 kHz, and 4 MHz, and 13.56 MHz. It is reconfirmed that the sustaining mechanism of the discharge at low frequency is ionization by secondary electrons from the electrode, while at high frequency it is ionization due to reflected electrons by the oscillating sheath. At middle frequency, 4 MHz, the sustaining mechanism drastically varies with input power density from the high-frequency type to the low-frequency type.

Original languageEnglish
Pages (from-to)4907-4914
Number of pages8
JournalJournal of Applied Physics
Volume74
Issue number8
DOIs
Publication statusPublished - 1993

Fingerprint

sustaining
glow discharges
radio frequencies
electric potential
low frequencies
phase shift
polyatomic gases
radio frequency discharge
ionization
electrons
sheaths
radiant flux density
high voltages
modulation
electrodes
gases
excitation

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Frequency dependence on the structure of radio frequency glow discharges in Ar. / Kakuta, Shigeru; Makabe, Toshiaki; Tochikubo, Fumiyoshi.

In: Journal of Applied Physics, Vol. 74, No. 8, 1993, p. 4907-4914.

Research output: Contribution to journalArticle

Kakuta, Shigeru ; Makabe, Toshiaki ; Tochikubo, Fumiyoshi. / Frequency dependence on the structure of radio frequency glow discharges in Ar. In: Journal of Applied Physics. 1993 ; Vol. 74, No. 8. pp. 4907-4914.
@article{2fcdc991c00f4b23bfb593e3ec1d9850,
title = "Frequency dependence on the structure of radio frequency glow discharges in Ar",
abstract = "The frequency dependence of the sustaining voltage in a radio frequency discharge has been investigated under minimum sustaining and constant power conditions in Ar. In addition to the well-known feature that the sustaining voltage is high at low frequency and low at high frequency, the difference between monoatomic and polyatomic gases is recognized. The phase shift between voltage and current at 1 Torr decreases with increasing frequency above 500 kHz. This results from the electron density modulation having a delay with respect to the applied voltage. The phase shift at high frequency increases with increasing applied voltage, due to the balance of drift and diffusion fluxes of electron. The spatiotemporal net excitation rate of Ar(3p5) was measured at 100 kHz, and 4 MHz, and 13.56 MHz. It is reconfirmed that the sustaining mechanism of the discharge at low frequency is ionization by secondary electrons from the electrode, while at high frequency it is ionization due to reflected electrons by the oscillating sheath. At middle frequency, 4 MHz, the sustaining mechanism drastically varies with input power density from the high-frequency type to the low-frequency type.",
author = "Shigeru Kakuta and Toshiaki Makabe and Fumiyoshi Tochikubo",
year = "1993",
doi = "10.1063/1.354324",
language = "English",
volume = "74",
pages = "4907--4914",
journal = "Journal of Applied Physics",
issn = "0021-8979",
publisher = "American Institute of Physics Publising LLC",
number = "8",

}

TY - JOUR

T1 - Frequency dependence on the structure of radio frequency glow discharges in Ar

AU - Kakuta, Shigeru

AU - Makabe, Toshiaki

AU - Tochikubo, Fumiyoshi

PY - 1993

Y1 - 1993

N2 - The frequency dependence of the sustaining voltage in a radio frequency discharge has been investigated under minimum sustaining and constant power conditions in Ar. In addition to the well-known feature that the sustaining voltage is high at low frequency and low at high frequency, the difference between monoatomic and polyatomic gases is recognized. The phase shift between voltage and current at 1 Torr decreases with increasing frequency above 500 kHz. This results from the electron density modulation having a delay with respect to the applied voltage. The phase shift at high frequency increases with increasing applied voltage, due to the balance of drift and diffusion fluxes of electron. The spatiotemporal net excitation rate of Ar(3p5) was measured at 100 kHz, and 4 MHz, and 13.56 MHz. It is reconfirmed that the sustaining mechanism of the discharge at low frequency is ionization by secondary electrons from the electrode, while at high frequency it is ionization due to reflected electrons by the oscillating sheath. At middle frequency, 4 MHz, the sustaining mechanism drastically varies with input power density from the high-frequency type to the low-frequency type.

AB - The frequency dependence of the sustaining voltage in a radio frequency discharge has been investigated under minimum sustaining and constant power conditions in Ar. In addition to the well-known feature that the sustaining voltage is high at low frequency and low at high frequency, the difference between monoatomic and polyatomic gases is recognized. The phase shift between voltage and current at 1 Torr decreases with increasing frequency above 500 kHz. This results from the electron density modulation having a delay with respect to the applied voltage. The phase shift at high frequency increases with increasing applied voltage, due to the balance of drift and diffusion fluxes of electron. The spatiotemporal net excitation rate of Ar(3p5) was measured at 100 kHz, and 4 MHz, and 13.56 MHz. It is reconfirmed that the sustaining mechanism of the discharge at low frequency is ionization by secondary electrons from the electrode, while at high frequency it is ionization due to reflected electrons by the oscillating sheath. At middle frequency, 4 MHz, the sustaining mechanism drastically varies with input power density from the high-frequency type to the low-frequency type.

UR - http://www.scopus.com/inward/record.url?scp=0005697001&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0005697001&partnerID=8YFLogxK

U2 - 10.1063/1.354324

DO - 10.1063/1.354324

M3 - Article

AN - SCOPUS:0005697001

VL - 74

SP - 4907

EP - 4914

JO - Journal of Applied Physics

JF - Journal of Applied Physics

SN - 0021-8979

IS - 8

ER -