Functional separation in two frequency operation of an inductively coupled plasma

T. Denda, Y. Miyoshi, Y. Komukai, T. Goto, Z. Lj Petrović, T. Makabe

Research output: Contribution to journalArticle

58 Citations (Scopus)

Abstract

A study was conducted on the inductively coupled plasma characteristics in pure Ar and CF4(5%)/Ar in front of the biased electrode that was 65 mm away from the coil. A set of measurements was performed including the 3D profiles of short lived 2pi state and the metastables towards more nonuniform profiles as pressure increases. As a result, very small effect of the gas flow was observed in the present chamber.

Original languageEnglish
Pages (from-to)870-876
Number of pages7
JournalJournal of Applied Physics
Volume95
Issue number3
DOIs
Publication statusPublished - 2004 Feb 1

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profiles
gas flow
coils
chambers
electrodes

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

Cite this

Denda, T., Miyoshi, Y., Komukai, Y., Goto, T., Petrović, Z. L., & Makabe, T. (2004). Functional separation in two frequency operation of an inductively coupled plasma. Journal of Applied Physics, 95(3), 870-876. https://doi.org/10.1063/1.1636527

Functional separation in two frequency operation of an inductively coupled plasma. / Denda, T.; Miyoshi, Y.; Komukai, Y.; Goto, T.; Petrović, Z. Lj; Makabe, T.

In: Journal of Applied Physics, Vol. 95, No. 3, 01.02.2004, p. 870-876.

Research output: Contribution to journalArticle

Denda, T, Miyoshi, Y, Komukai, Y, Goto, T, Petrović, ZL & Makabe, T 2004, 'Functional separation in two frequency operation of an inductively coupled plasma', Journal of Applied Physics, vol. 95, no. 3, pp. 870-876. https://doi.org/10.1063/1.1636527
Denda, T. ; Miyoshi, Y. ; Komukai, Y. ; Goto, T. ; Petrović, Z. Lj ; Makabe, T. / Functional separation in two frequency operation of an inductively coupled plasma. In: Journal of Applied Physics. 2004 ; Vol. 95, No. 3. pp. 870-876.
@article{52015f2c01ab46dcbadb46d50757845f,
title = "Functional separation in two frequency operation of an inductively coupled plasma",
abstract = "A study was conducted on the inductively coupled plasma characteristics in pure Ar and CF4(5{\%})/Ar in front of the biased electrode that was 65 mm away from the coil. A set of measurements was performed including the 3D profiles of short lived 2pi state and the metastables towards more nonuniform profiles as pressure increases. As a result, very small effect of the gas flow was observed in the present chamber.",
author = "T. Denda and Y. Miyoshi and Y. Komukai and T. Goto and Petrović, {Z. Lj} and T. Makabe",
year = "2004",
month = "2",
day = "1",
doi = "10.1063/1.1636527",
language = "English",
volume = "95",
pages = "870--876",
journal = "Journal of Applied Physics",
issn = "0021-8979",
publisher = "American Institute of Physics Publising LLC",
number = "3",

}

TY - JOUR

T1 - Functional separation in two frequency operation of an inductively coupled plasma

AU - Denda, T.

AU - Miyoshi, Y.

AU - Komukai, Y.

AU - Goto, T.

AU - Petrović, Z. Lj

AU - Makabe, T.

PY - 2004/2/1

Y1 - 2004/2/1

N2 - A study was conducted on the inductively coupled plasma characteristics in pure Ar and CF4(5%)/Ar in front of the biased electrode that was 65 mm away from the coil. A set of measurements was performed including the 3D profiles of short lived 2pi state and the metastables towards more nonuniform profiles as pressure increases. As a result, very small effect of the gas flow was observed in the present chamber.

AB - A study was conducted on the inductively coupled plasma characteristics in pure Ar and CF4(5%)/Ar in front of the biased electrode that was 65 mm away from the coil. A set of measurements was performed including the 3D profiles of short lived 2pi state and the metastables towards more nonuniform profiles as pressure increases. As a result, very small effect of the gas flow was observed in the present chamber.

UR - http://www.scopus.com/inward/record.url?scp=1142304540&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=1142304540&partnerID=8YFLogxK

U2 - 10.1063/1.1636527

DO - 10.1063/1.1636527

M3 - Article

AN - SCOPUS:1142304540

VL - 95

SP - 870

EP - 876

JO - Journal of Applied Physics

JF - Journal of Applied Physics

SN - 0021-8979

IS - 3

ER -