Functional separation in two frequency operation of an inductively coupled plasma

T. Denda; Y. Miyoshi; Y. Komukai; T. Goto; Z. Lj Petrović; T. Makabe

doi:10.1063/1.1636527

Functional separation in two frequency operation of an inductively coupled plasma

T. Denda, Y. Miyoshi, Y. Komukai, T. Goto, Z. Lj Petrović, T. Makabe

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Abstract

A study was conducted on the inductively coupled plasma characteristics in pure Ar and CF₄(5%)/Ar in front of the biased electrode that was 65 mm away from the coil. A set of measurements was performed including the 3D profiles of short lived 2p_i state and the metastables towards more nonuniform profiles as pressure increases. As a result, very small effect of the gas flow was observed in the present chamber.

Original language	English
Pages (from-to)	870-876
Number of pages	7
Journal	Journal of Applied Physics
Volume	95
Issue number	3
DOIs	https://doi.org/10.1063/1.1636527
Publication status	Published - 2004 Feb 1

ASJC Scopus subject areas

Physics and Astronomy(all)

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10.1063/1.1636527

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AU - Miyoshi, Y.

AU - Komukai, Y.

AU - Goto, T.

AU - Petrović, Z. Lj

AU - Makabe, T.

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Functional separation in two frequency operation of an inductively coupled plasma

Abstract

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