Functional separation in two frequency operation of an inductively coupled plasma

T. Denda, Y. Miyoshi, Y. Komukai, T. Goto, Z. Lj Petrović, T. Makabe

Research output: Contribution to journalArticle

59 Citations (Scopus)

Abstract

A study was conducted on the inductively coupled plasma characteristics in pure Ar and CF4(5%)/Ar in front of the biased electrode that was 65 mm away from the coil. A set of measurements was performed including the 3D profiles of short lived 2pi state and the metastables towards more nonuniform profiles as pressure increases. As a result, very small effect of the gas flow was observed in the present chamber.

Original languageEnglish
Pages (from-to)870-876
Number of pages7
JournalJournal of Applied Physics
Volume95
Issue number3
DOIs
Publication statusPublished - 2004 Feb 1

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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  • Cite this

    Denda, T., Miyoshi, Y., Komukai, Y., Goto, T., Petrović, Z. L., & Makabe, T. (2004). Functional separation in two frequency operation of an inductively coupled plasma. Journal of Applied Physics, 95(3), 870-876. https://doi.org/10.1063/1.1636527