Generation of high-quality lines and arrays using nanoparticle controlling processes

Seung H. Huh; Doh H. Riu; Y. Naono; Yoshihiro Taguchi; S. Kawabata; Atsushi Nakajima

doi:10.1063/1.2778464

Generation of high-quality lines and arrays using nanoparticle controlling processes

Seung H. Huh, Doh H. Riu, Y. Naono, Yoshihiro Taguchi, S. Kawabata, Atsushi Nakajima

Research output: Contribution to journal › Article

9 Citations (Scopus)

Abstract

Highly reliable lines and arrays comprising the smallest metallic nanoparticles (NPs) were produced by using a combination of techniques such as lithography, lift-off, size selection, aerosol deposition, and NP colloids. The narrowest 80 nm Au lines were produced by the deposition of only 4 nm Au NPs, driven by two factors-NP kinetics and collision-induced surface melting. An array of unsupported free 30-100 Ni NPs and one of 20-40 nm Ni NPs supported in holes were produced by the principles of hole-size-induced filtering and the binding of thiol groups.

Original language	English
Article number	093118
Journal	Applied Physics Letters
Volume	91
Issue number	9
DOIs	https://doi.org/10.1063/1.2778464
Publication status	Published - 2007

Fingerprint

nanoparticles

thiols

colloids

aerosols

lithography

melting

collisions

kinetics

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

Cite this

Huh, S. H., Riu, D. H., Naono, Y., Taguchi, Y., Kawabata, S., & Nakajima, A. (2007). Generation of high-quality lines and arrays using nanoparticle controlling processes. Applied Physics Letters, 91(9), [093118]. https://doi.org/10.1063/1.2778464

Generation of high-quality lines and arrays using nanoparticle controlling processes. / Huh, Seung H.; Riu, Doh H.; Naono, Y.; Taguchi, Yoshihiro; Kawabata, S.; Nakajima, Atsushi.

In: Applied Physics Letters, Vol. 91, No. 9, 093118, 2007.

Research output: Contribution to journal › Article

Huh, SH, Riu, DH, Naono, Y, Taguchi, Y, Kawabata, S & Nakajima, A 2007, 'Generation of high-quality lines and arrays using nanoparticle controlling processes', Applied Physics Letters, vol. 91, no. 9, 093118. https://doi.org/10.1063/1.2778464

Huh SH, Riu DH, Naono Y, Taguchi Y, Kawabata S, Nakajima A. Generation of high-quality lines and arrays using nanoparticle controlling processes. Applied Physics Letters. 2007;91(9). 093118. https://doi.org/10.1063/1.2778464

Huh, Seung H. ; Riu, Doh H. ; Naono, Y. ; Taguchi, Yoshihiro ; Kawabata, S. ; Nakajima, Atsushi. / Generation of high-quality lines and arrays using nanoparticle controlling processes. In: Applied Physics Letters. 2007 ; Vol. 91, No. 9.

@article{88d7f5ece41c44d89a5a12850b6c637d,

title = "Generation of high-quality lines and arrays using nanoparticle controlling processes",

abstract = "Highly reliable lines and arrays comprising the smallest metallic nanoparticles (NPs) were produced by using a combination of techniques such as lithography, lift-off, size selection, aerosol deposition, and NP colloids. The narrowest 80 nm Au lines were produced by the deposition of only 4 nm Au NPs, driven by two factors-NP kinetics and collision-induced surface melting. An array of unsupported free 30-100 Ni NPs and one of 20-40 nm Ni NPs supported in holes were produced by the principles of hole-size-induced filtering and the binding of thiol groups.",

author = "Huh, {Seung H.} and Riu, {Doh H.} and Y. Naono and Yoshihiro Taguchi and S. Kawabata and Atsushi Nakajima",

year = "2007",

doi = "10.1063/1.2778464",

language = "English",

volume = "91",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics Publising LLC",

number = "9",

}

TY - JOUR

T1 - Generation of high-quality lines and arrays using nanoparticle controlling processes

AU - Huh, Seung H.

AU - Riu, Doh H.

AU - Naono, Y.

AU - Taguchi, Yoshihiro

AU - Kawabata, S.

AU - Nakajima, Atsushi

PY - 2007

Y1 - 2007

N2 - Highly reliable lines and arrays comprising the smallest metallic nanoparticles (NPs) were produced by using a combination of techniques such as lithography, lift-off, size selection, aerosol deposition, and NP colloids. The narrowest 80 nm Au lines were produced by the deposition of only 4 nm Au NPs, driven by two factors-NP kinetics and collision-induced surface melting. An array of unsupported free 30-100 Ni NPs and one of 20-40 nm Ni NPs supported in holes were produced by the principles of hole-size-induced filtering and the binding of thiol groups.

AB - Highly reliable lines and arrays comprising the smallest metallic nanoparticles (NPs) were produced by using a combination of techniques such as lithography, lift-off, size selection, aerosol deposition, and NP colloids. The narrowest 80 nm Au lines were produced by the deposition of only 4 nm Au NPs, driven by two factors-NP kinetics and collision-induced surface melting. An array of unsupported free 30-100 Ni NPs and one of 20-40 nm Ni NPs supported in holes were produced by the principles of hole-size-induced filtering and the binding of thiol groups.

UR - http://www.scopus.com/inward/record.url?scp=34548445928&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=34548445928&partnerID=8YFLogxK

U2 - 10.1063/1.2778464

DO - 10.1063/1.2778464

M3 - Article

VL - 91

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

IS - 9

M1 - 093118

ER -

Access to Document

10.1063/1.2778464