Generation of high-quality lines and arrays using nanoparticle controlling processes

Seung H. Huh, Doh H. Riu, Y. Naono, Yoshihiro Taguchi, S. Kawabata, Atsushi Nakajima

Research output: Contribution to journal › Article

9 Citations (Scopus)

Abstract

Highly reliable lines and arrays comprising the smallest metallic nanoparticles (NPs) were produced by using a combination of techniques such as lithography, lift-off, size selection, aerosol deposition, and NP colloids. The narrowest 80 nm Au lines were produced by the deposition of only 4 nm Au NPs, driven by two factors-NP kinetics and collision-induced surface melting. An array of unsupported free 30-100 Ni NPs and one of 20-40 nm Ni NPs supported in holes were produced by the principles of hole-size-induced filtering and the binding of thiol groups.

Original languageEnglish
Article number093118
JournalApplied Physics Letters
Volume91
Issue number9
DOIs
Publication statusPublished - 2007

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nanoparticles
thiols
colloids
aerosols
lithography
melting
collisions
kinetics

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Generation of high-quality lines and arrays using nanoparticle controlling processes. / Huh, Seung H.; Riu, Doh H.; Naono, Y.; Taguchi, Yoshihiro; Kawabata, S.; Nakajima, Atsushi.

In: Applied Physics Letters, Vol. 91, No. 9, 093118, 2007.

Research output: Contribution to journal › Article

Huh, SH, Riu, DH, Naono, Y, Taguchi, Y, Kawabata, S & Nakajima, A 2007, 'Generation of high-quality lines and arrays using nanoparticle controlling processes', Applied Physics Letters, vol. 91, no. 9, 093118. https://doi.org/10.1063/1.2778464
Huh SH, Riu DH, Naono Y, Taguchi Y, Kawabata S, Nakajima A. Generation of high-quality lines and arrays using nanoparticle controlling processes. Applied Physics Letters. 2007;91(9). 093118. https://doi.org/10.1063/1.2778464
Huh, Seung H. ; Riu, Doh H. ; Naono, Y. ; Taguchi, Yoshihiro ; Kawabata, S. ; Nakajima, Atsushi. / Generation of high-quality lines and arrays using nanoparticle controlling processes. In: Applied Physics Letters. 2007 ; Vol. 91, No. 9.
@article{88d7f5ece41c44d89a5a12850b6c637d,
title = "Generation of high-quality lines and arrays using nanoparticle controlling processes",
abstract = "Highly reliable lines and arrays comprising the smallest metallic nanoparticles (NPs) were produced by using a combination of techniques such as lithography, lift-off, size selection, aerosol deposition, and NP colloids. The narrowest 80 nm Au lines were produced by the deposition of only 4 nm Au NPs, driven by two factors-NP kinetics and collision-induced surface melting. An array of unsupported free 30-100 Ni NPs and one of 20-40 nm Ni NPs supported in holes were produced by the principles of hole-size-induced filtering and the binding of thiol groups.",
author = "Huh, {Seung H.} and Riu, {Doh H.} and Y. Naono and Yoshihiro Taguchi and S. Kawabata and Atsushi Nakajima",
year = "2007",
doi = "10.1063/1.2778464",
language = "English",
volume = "91",
journal = "Applied Physics Letters",
issn = "0003-6951",
publisher = "American Institute of Physics Publising LLC",
number = "9",

}

TY - JOUR

T1 - Generation of high-quality lines and arrays using nanoparticle controlling processes

AU - Huh, Seung H.

AU - Riu, Doh H.

AU - Naono, Y.

AU - Taguchi, Yoshihiro

AU - Kawabata, S.

AU - Nakajima, Atsushi

PY - 2007

Y1 - 2007

N2 - Highly reliable lines and arrays comprising the smallest metallic nanoparticles (NPs) were produced by using a combination of techniques such as lithography, lift-off, size selection, aerosol deposition, and NP colloids. The narrowest 80 nm Au lines were produced by the deposition of only 4 nm Au NPs, driven by two factors-NP kinetics and collision-induced surface melting. An array of unsupported free 30-100 Ni NPs and one of 20-40 nm Ni NPs supported in holes were produced by the principles of hole-size-induced filtering and the binding of thiol groups.

AB - Highly reliable lines and arrays comprising the smallest metallic nanoparticles (NPs) were produced by using a combination of techniques such as lithography, lift-off, size selection, aerosol deposition, and NP colloids. The narrowest 80 nm Au lines were produced by the deposition of only 4 nm Au NPs, driven by two factors-NP kinetics and collision-induced surface melting. An array of unsupported free 30-100 Ni NPs and one of 20-40 nm Ni NPs supported in holes were produced by the principles of hole-size-induced filtering and the binding of thiol groups.

UR - http://www.scopus.com/inward/record.url?scp=34548445928&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=34548445928&partnerID=8YFLogxK

U2 - 10.1063/1.2778464

DO - 10.1063/1.2778464

M3 - Article

AN - SCOPUS:34548445928

VL - 91

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

IS - 9

M1 - 093118

ER -

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