Growth process of hydrogenated amorphous carbon films synthesized by atmospheric pressure plasma enhanced CVD using nitrogen and helium as a dilution gas

Takanori Mori, Takachika Sakurai, Taiki Sato, Akira Shirakura, Tetsuya Suzuki

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Hydrogenated amorphous carbon films with various thicknesses were synthesized by dielectric barrier discharge-based plasma deposition under atmospheric pressure diluted with nitrogen (N2) and helium (He) at various pulse frequencies. The C2H2/N2 film showed cauliflower-like-particles that grew bigger with the increase in film's thickness. At 5 kHz, the film with a thickness of 2.7μm and smooth surface was synthesized. On the other hand, the films synthesized from C2H2/He had a smooth surface and was densely packed with domed particles. The domed particles extended with the increase in the film thickness, enabling it to grow successfully to 37μm with a smooth surface.

Original languageEnglish
Article number045503
JournalJapanese Journal of Applied Physics
Volume55
Issue number4
DOIs
Publication statusPublished - 2016 Apr 1

Fingerprint

Carbon films
Amorphous carbon
Amorphous films
Plasma enhanced chemical vapor deposition
Dilution
Atmospheric pressure
Helium
dilution
atmospheric pressure
helium
vapor deposition
Nitrogen
nitrogen
Film thickness
carbon
Gases
gases
Plasma deposition
film thickness
pulses

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Growth process of hydrogenated amorphous carbon films synthesized by atmospheric pressure plasma enhanced CVD using nitrogen and helium as a dilution gas. / Mori, Takanori; Sakurai, Takachika; Sato, Taiki; Shirakura, Akira; Suzuki, Tetsuya.

In: Japanese Journal of Applied Physics, Vol. 55, No. 4, 045503, 01.04.2016.

Research output: Contribution to journalArticle

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