Growth process of hydrogenated amorphous carbon films synthesized by atmospheric pressure plasma enhanced CVD using nitrogen and helium as a dilution gas

Takanori Mori, Takachika Sakurai, Taiki Sato, Akira Shirakura, Tetsuya Suzuki

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

Hydrogenated amorphous carbon films with various thicknesses were synthesized by dielectric barrier discharge-based plasma deposition under atmospheric pressure diluted with nitrogen (N2) and helium (He) at various pulse frequencies. The C2H2/N2 film showed cauliflower-like-particles that grew bigger with the increase in film's thickness. At 5 kHz, the film with a thickness of 2.7μm and smooth surface was synthesized. On the other hand, the films synthesized from C2H2/He had a smooth surface and was densely packed with domed particles. The domed particles extended with the increase in the film thickness, enabling it to grow successfully to 37μm with a smooth surface.

Original languageEnglish
Article number045503
JournalJapanese Journal of Applied Physics
Volume55
Issue number4
DOIs
Publication statusPublished - 2016 Apr 1

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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