Hard Carbon Films Synthesized By Atmospheric Pressure Filamentary Dielectric Barrier Discharge

Tetsuya Suzuki, Akira Shirakura

Research output: Contribution to journalArticle

Abstract

To synthesize hydrogenated amorphous carbon (a-C:H) films, filamentary dielectric discharge (FDBD) is used to improve their mechanical properties compared to the films synthesized by glow dielectric barrier discharge (GDBD), which is generally used for atmospheric pressure-plasma-enhanced chemical vapor deposition. The discharge form transitioned from GDBD to FDBD when the gap between the electrodes is increased from 1 to 4 mm. The hardness of the films increased from 3.7 to 11.9 GPa by using FDBD. The results indicate that hard a-C:H films can be synthesized at room temperature by atmospheric pressure using FDBD.

Original languageEnglish
Article number1800084
JournalMacromolecular Symposia
Volume382
Issue number1
DOIs
Publication statusPublished - 2018 Dec 1

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Keywords

  • amorphous
  • atmospheric pressure
  • carbon
  • hardness
  • plasma CVD

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Organic Chemistry
  • Polymers and Plastics
  • Materials Chemistry

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