Hardness and surface roughness of hydrogenated amorphous carbon-based films synthesized by atmospheric pressure-plasma enhanced chemical vapor deposition at low temperature

Mayui Noborisaka, Ryohei Horikoshi, So Nagashima, Akira Shirakura, Tetsuya Suzuki

Research output: Contribution to journalArticle

8 Citations (Scopus)


Hydrogenated amorphous carbon (a-C:H)-based films were synthesized by the dielectric barrier discharge-based plasma deposition at atmospheric pressure from C2H2 diluted with He or N2 gas with varying dilution ratios (R) and their hardness, surface roughness and chemical composition were analyzed. The films deposited from C2H 2/N2 contained nitrogen elements and they were softer with rougher surface compared with the a-C:H films deposited from C 2H2/He. Additionally the amount of nitrogen incorporation increased as the ratio R decreased, which led to deterioration of hardness and surface smoothness. As for C2H2/He, the film hardness slightly increased by decreasing the ratio R and the a-C:H (R = 1%) showed a maximum hardness of 1.1 GPa.

Original languageEnglish
Pages (from-to)114-119
Number of pages6
JournalThin Solid Films
Publication statusPublished - 2013 Jan 1



  • Atmospheric pressure plasma-enhanced chemical vapor deposition
  • Dilution gas
  • Hydrogenated amorphous carbon
  • Keywords
  • Low temperature
  • Surface roughness
  • Thin films

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Cite this