High-intensity near-field generation for silicon nanoparticle arrays with oblique irradiation for large-area high-throughput nanopatterning

T. Miyanishi, Y. Tsunoi, Mitsuhiro Terakawa, M. Obara

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

We present near-field distributions around an isolated 800-nm silica or silicon nanoparticle, and nanoparticle arrays of 800-nm silica or silicon nanoparticles, on a silicon substrate by the finite-difference time-domain method when 800-nm light is irradiated obliquely to the substrate. Nanopatterning mediated with the nanoparticle system is promising for large-area, high-throughput patterning by using an enhanced localized near-field ablation by the nanoscattered light lens effect. The irradiation area cannot be extended for silica nanoparticles, because the optical field enhancement factor is low. Gold nanoparticles can generate highly enhanced near fields, although at present there are no useful ways to arrange the gold nanoparticles on the substrate at a high throughput. Silicon nanoparticles with high dielectric permittivity have optical characteristics of both silica and gold nanoparticles. The particle arrangement on the Si substrate is technically easy using a wet pulling process. From the calculation, high optical field intensity is acquired with oblique s-polarized irradiation to the substrate under silicon nanoparticle arrays, and the intensity is almost the same as that under gold nanoparticle arrays under the same condition. With this method, high-throughput nanopatterning for a large area would be achievable.

Original languageEnglish
Pages (from-to)323-332
Number of pages10
JournalApplied Physics B: Lasers and Optics
Volume107
Issue number2
DOIs
Publication statusPublished - 2012 May

Fingerprint

near fields
Throughput
Irradiation
Nanoparticles
Silicon
nanoparticles
irradiation
silicon
Gold
Silica
gold
silicon dioxide
Substrates
Finite difference time domain method
pulling
Ablation
finite difference time domain method
ablation
Lenses
Permittivity

ASJC Scopus subject areas

  • Physics and Astronomy(all)
  • Physics and Astronomy (miscellaneous)

Cite this

High-intensity near-field generation for silicon nanoparticle arrays with oblique irradiation for large-area high-throughput nanopatterning. / Miyanishi, T.; Tsunoi, Y.; Terakawa, Mitsuhiro; Obara, M.

In: Applied Physics B: Lasers and Optics, Vol. 107, No. 2, 05.2012, p. 323-332.

Research output: Contribution to journalArticle

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