High-pressure NO-induced mixed phase on Rh(111): Chemically driven replacement

Ryo Toyoshima; Masaaki Yoshida; Yuji Monya; Kazuma Suzuki; Kenta Amemiya; Kazuhiko Mase; Bongjin Simon Mun; Hiroshi Kondoh

doi:10.1021/jp507542h

High-pressure NO-induced mixed phase on Rh(111): Chemically driven replacement

Ryo Toyoshima, Masaaki Yoshida, Yuji Monya, Kazuma Suzuki, Kenta Amemiya, Kazuhiko Mase, Bongjin Simon Mun, Hiroshi Kondoh

Department of Chemistry

Research output: Contribution to journal › Article › peer-review

11 Citations (Scopus)

Abstract

The interaction between nitric oxide (NO) and Rh(111) surface has been investigated by a combination of near-ambient-pressure X-ray photoelectron spectroscopy, low energy electron diffraction, and density functional theory calculations. Under low-temperature and ultrahigh vacuum conditions, our experimental and computational results are consistent with the previous reports for NO adsorption phases on Rh(111). While at room temperature and upon exposure to gaseous NO of 100 mTorr, NO molecules partially dissociate followed by chemical removal of atomic nitrogen by NO from the surface, and the remaining atomic oxygen and NO form a NO/O mixed phase. Interestingly, this mixed phase is stable even after NO evacuation and shows a well-ordered (2 × 2) periodicity. These observations provide a new insight into the NO/Rh(111) system under near-ambient-pressure condition.

Original language	English
Pages (from-to)	3033-3039
Number of pages	7
Journal	Journal of Physical Chemistry C
Volume	119
Issue number	6
DOIs	https://doi.org/10.1021/jp507542h
Publication status	Published - 2015 Feb 12

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Energy(all)
Physical and Theoretical Chemistry
Surfaces, Coatings and Films

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10.1021/jp507542h

Cite this

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abstract = "The interaction between nitric oxide (NO) and Rh(111) surface has been investigated by a combination of near-ambient-pressure X-ray photoelectron spectroscopy, low energy electron diffraction, and density functional theory calculations. Under low-temperature and ultrahigh vacuum conditions, our experimental and computational results are consistent with the previous reports for NO adsorption phases on Rh(111). While at room temperature and upon exposure to gaseous NO of 100 mTorr, NO molecules partially dissociate followed by chemical removal of atomic nitrogen by NO from the surface, and the remaining atomic oxygen and NO form a NO/O mixed phase. Interestingly, this mixed phase is stable even after NO evacuation and shows a well-ordered (2 × 2) periodicity. These observations provide a new insight into the NO/Rh(111) system under near-ambient-pressure condition.",

author = "Ryo Toyoshima and Masaaki Yoshida and Yuji Monya and Kazuma Suzuki and Kenta Amemiya and Kazuhiko Mase and Mun, {Bongjin Simon} and Hiroshi Kondoh",

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T1 - High-pressure NO-induced mixed phase on Rh(111)

T2 - Chemically driven replacement

AU - Toyoshima, Ryo

AU - Yoshida, Masaaki

AU - Monya, Yuji

AU - Suzuki, Kazuma

AU - Amemiya, Kenta

AU - Mase, Kazuhiko

AU - Mun, Bongjin Simon

AU - Kondoh, Hiroshi

PY - 2015/2/12

Y1 - 2015/2/12

N2 - The interaction between nitric oxide (NO) and Rh(111) surface has been investigated by a combination of near-ambient-pressure X-ray photoelectron spectroscopy, low energy electron diffraction, and density functional theory calculations. Under low-temperature and ultrahigh vacuum conditions, our experimental and computational results are consistent with the previous reports for NO adsorption phases on Rh(111). While at room temperature and upon exposure to gaseous NO of 100 mTorr, NO molecules partially dissociate followed by chemical removal of atomic nitrogen by NO from the surface, and the remaining atomic oxygen and NO form a NO/O mixed phase. Interestingly, this mixed phase is stable even after NO evacuation and shows a well-ordered (2 × 2) periodicity. These observations provide a new insight into the NO/Rh(111) system under near-ambient-pressure condition.

AB - The interaction between nitric oxide (NO) and Rh(111) surface has been investigated by a combination of near-ambient-pressure X-ray photoelectron spectroscopy, low energy electron diffraction, and density functional theory calculations. Under low-temperature and ultrahigh vacuum conditions, our experimental and computational results are consistent with the previous reports for NO adsorption phases on Rh(111). While at room temperature and upon exposure to gaseous NO of 100 mTorr, NO molecules partially dissociate followed by chemical removal of atomic nitrogen by NO from the surface, and the remaining atomic oxygen and NO form a NO/O mixed phase. Interestingly, this mixed phase is stable even after NO evacuation and shows a well-ordered (2 × 2) periodicity. These observations provide a new insight into the NO/Rh(111) system under near-ambient-pressure condition.

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High-pressure NO-induced mixed phase on Rh(111): Chemically driven replacement

Abstract

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