High-Quality Transparent Conducting Oxide Films Deposited by a Novel Ion Plating Technique

T. Sakemi, S. Shirakata, K. Iwata, K. Matsubara, H. Tampo, P. Fons, S. Niki, K. Awai, T. Yamamoto

Research output: Contribution to journalConference article

Abstract

A novel ion plating technique that has the attributes of both superb controllability of the high density plasma used as well as ion beam shape has been developed and applied to the deposition of transparent conducting oxides. The advantages of this technique include reduced ion damage, scale-up capability, in-plane uniformity, the use of low growth temperatures and fast deposition rates suggesting that the technique is very promising for a variety of applications such as solar cells and organic device fabrication. Gallium doped zinc oxide films have been deposited on glass substrates at 200°C. Resistivities as low as ρ∼2.7×10-4Ω-cm with high transparency have been demonstrated. In addition, this technique has been successfully applied to large area deposition such as 65 cm × 55 cm-sized glass substrates.

Original languageEnglish
Pages (from-to)301-306
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Volume763
Publication statusPublished - 2003 Dec 8
Externally publishedYes
EventMATERIALS RESEARCH SOCIETY SYMPOSIUM - PROCEEDINGS: Compound Semiconductor Photovoltaics - San Francisco, CA, United States
Duration: 2003 Apr 222003 Apr 25

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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    Sakemi, T., Shirakata, S., Iwata, K., Matsubara, K., Tampo, H., Fons, P., Niki, S., Awai, K., & Yamamoto, T. (2003). High-Quality Transparent Conducting Oxide Films Deposited by a Novel Ion Plating Technique. Materials Research Society Symposium - Proceedings, 763, 301-306.