High Spatial Resolution OBIRCH and OBIC Effects Realized by Near-field Optical Probe in the Analysis of High Resistance 200 nm Wide TiSi Line

K. Nikawa, T. Saiki, S. Inoue, M. Ohtsu

Research output: Contribution to conferencePaper

3 Citations (Scopus)

Abstract

The optical-beam-induced resistance-change-detection (OBRICH) method which used near-field-optical-probe as heat source was investigated for high resolution 200 nm wide TiSi line. The OBRICH used laser-beam heating and resistance-change detection processes. An Ar laser was introduced to test NF-OBIRCH method into near-field optical probe and was scanned in the area of interest which used shear force feedback technique. The results show that the OBIRCH method had higher spatial resolution and the method caused by heating was observed when metallized probe was used without interference from the optical beam induced current (OBIC).

Original languageEnglish
Pages25-29
Number of pages5
Publication statusPublished - 1998 Dec 1
Externally publishedYes
EventProceedings of the 24th Symposium for Testing and Failure Analysis - Dallas, TX, United States
Duration: 1998 Nov 151998 Nov 19

Other

OtherProceedings of the 24th Symposium for Testing and Failure Analysis
CountryUnited States
CityDallas, TX
Period98/11/1598/11/19

ASJC Scopus subject areas

  • Control and Systems Engineering
  • Safety, Risk, Reliability and Quality
  • Electrical and Electronic Engineering

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  • Cite this

    Nikawa, K., Saiki, T., Inoue, S., & Ohtsu, M. (1998). High Spatial Resolution OBIRCH and OBIC Effects Realized by Near-field Optical Probe in the Analysis of High Resistance 200 nm Wide TiSi Line. 25-29. Paper presented at Proceedings of the 24th Symposium for Testing and Failure Analysis, Dallas, TX, United States.