High Spatial Resolution OBIRCH and OBIC Effects Realized by Near-field Optical Probe in the Analysis of High Resistance 200 nm Wide TiSi Line

K. Nikawa, Toshiharu Saiki, S. Inoue, M. Ohtsu

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Citations (Scopus)

Abstract

The optical-beam-induced resistance-change-detection (OBRICH) method which used near-field-optical-probe as heat source was investigated for high resolution 200 nm wide TiSi line. The OBRICH used laser-beam heating and resistance-change detection processes. An Ar laser was introduced to test NF-OBIRCH method into near-field optical probe and was scanned in the area of interest which used shear force feedback technique. The results show that the OBIRCH method had higher spatial resolution and the method caused by heating was observed when metallized probe was used without interference from the optical beam induced current (OBIC).

Original languageEnglish
Title of host publicationConference Proceedings from the International Symposium for Testing and Failure Analysis
Pages25-29
Number of pages5
Publication statusPublished - 1998
Externally publishedYes
EventProceedings of the 24th Symposium for Testing and Failure Analysis - Dallas, TX, United States
Duration: 1998 Nov 151998 Nov 19

Other

OtherProceedings of the 24th Symposium for Testing and Failure Analysis
CountryUnited States
CityDallas, TX
Period98/11/1598/11/19

Fingerprint

Induced currents
Heating
Laser beams
Feedback
Lasers

ASJC Scopus subject areas

  • Safety, Risk, Reliability and Quality

Cite this

Nikawa, K., Saiki, T., Inoue, S., & Ohtsu, M. (1998). High Spatial Resolution OBIRCH and OBIC Effects Realized by Near-field Optical Probe in the Analysis of High Resistance 200 nm Wide TiSi Line. In Conference Proceedings from the International Symposium for Testing and Failure Analysis (pp. 25-29)

High Spatial Resolution OBIRCH and OBIC Effects Realized by Near-field Optical Probe in the Analysis of High Resistance 200 nm Wide TiSi Line. / Nikawa, K.; Saiki, Toshiharu; Inoue, S.; Ohtsu, M.

Conference Proceedings from the International Symposium for Testing and Failure Analysis. 1998. p. 25-29.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Nikawa, K, Saiki, T, Inoue, S & Ohtsu, M 1998, High Spatial Resolution OBIRCH and OBIC Effects Realized by Near-field Optical Probe in the Analysis of High Resistance 200 nm Wide TiSi Line. in Conference Proceedings from the International Symposium for Testing and Failure Analysis. pp. 25-29, Proceedings of the 24th Symposium for Testing and Failure Analysis, Dallas, TX, United States, 98/11/15.
Nikawa K, Saiki T, Inoue S, Ohtsu M. High Spatial Resolution OBIRCH and OBIC Effects Realized by Near-field Optical Probe in the Analysis of High Resistance 200 nm Wide TiSi Line. In Conference Proceedings from the International Symposium for Testing and Failure Analysis. 1998. p. 25-29
Nikawa, K. ; Saiki, Toshiharu ; Inoue, S. ; Ohtsu, M. / High Spatial Resolution OBIRCH and OBIC Effects Realized by Near-field Optical Probe in the Analysis of High Resistance 200 nm Wide TiSi Line. Conference Proceedings from the International Symposium for Testing and Failure Analysis. 1998. pp. 25-29
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abstract = "The optical-beam-induced resistance-change-detection (OBRICH) method which used near-field-optical-probe as heat source was investigated for high resolution 200 nm wide TiSi line. The OBRICH used laser-beam heating and resistance-change detection processes. An Ar laser was introduced to test NF-OBIRCH method into near-field optical probe and was scanned in the area of interest which used shear force feedback technique. The results show that the OBIRCH method had higher spatial resolution and the method caused by heating was observed when metallized probe was used without interference from the optical beam induced current (OBIC).",
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