High Spatial Resolution OBIRCH and OBIC Effects Realized by Near-field Optical Probe in the Analysis of High Resistance 200 nm Wide TiSi Line

K. Nikawa; T. Saiki; S. Inoue; M. Ohtsu

High Spatial Resolution OBIRCH and OBIC Effects Realized by Near-field Optical Probe in the Analysis of High Resistance 200 nm Wide TiSi Line

K. Nikawa, T. Saiki, S. Inoue, M. Ohtsu

Research output: Contribution to conference › Paper › peer-review

Abstract

The optical-beam-induced resistance-change-detection (OBRICH) method which used near-field-optical-probe as heat source was investigated for high resolution 200 nm wide TiSi line. The OBRICH used laser-beam heating and resistance-change detection processes. An Ar laser was introduced to test NF-OBIRCH method into near-field optical probe and was scanned in the area of interest which used shear force feedback technique. The results show that the OBIRCH method had higher spatial resolution and the method caused by heating was observed when metallized probe was used without interference from the optical beam induced current (OBIC).

Original language	English
Pages	25-29
Number of pages	5
Publication status	Published - 1998
Externally published	Yes
Event	Proceedings of the 24th Symposium for Testing and Failure Analysis - Dallas, TX, United States Duration: 1998 Nov 15 → 1998 Nov 19

Other

Other	Proceedings of the 24th Symposium for Testing and Failure Analysis
Country/Territory	United States
City	Dallas, TX
Period	98/11/15 → 98/11/19

ASJC Scopus subject areas

Control and Systems Engineering
Safety, Risk, Reliability and Quality
Electrical and Electronic Engineering

Cite this

High Spatial Resolution OBIRCH and OBIC Effects Realized by Near-field Optical Probe in the Analysis of High Resistance 200 nm Wide TiSi Line. / Nikawa, K.; Saiki, T.; Inoue, S. et al.

1998. 25-29 Paper presented at Proceedings of the 24th Symposium for Testing and Failure Analysis, Dallas, TX, United States.

Research output: Contribution to conference › Paper › peer-review

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title = "High Spatial Resolution OBIRCH and OBIC Effects Realized by Near-field Optical Probe in the Analysis of High Resistance 200 nm Wide TiSi Line",

abstract = "The optical-beam-induced resistance-change-detection (OBRICH) method which used near-field-optical-probe as heat source was investigated for high resolution 200 nm wide TiSi line. The OBRICH used laser-beam heating and resistance-change detection processes. An Ar laser was introduced to test NF-OBIRCH method into near-field optical probe and was scanned in the area of interest which used shear force feedback technique. The results show that the OBIRCH method had higher spatial resolution and the method caused by heating was observed when metallized probe was used without interference from the optical beam induced current (OBIC).",

author = "K. Nikawa and T. Saiki and S. Inoue and M. Ohtsu",

year = "1998",

language = "English",

pages = "25--29",

note = "Proceedings of the 24th Symposium for Testing and Failure Analysis ; Conference date: 15-11-1998 Through 19-11-1998",

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T1 - High Spatial Resolution OBIRCH and OBIC Effects Realized by Near-field Optical Probe in the Analysis of High Resistance 200 nm Wide TiSi Line

AU - Nikawa, K.

AU - Saiki, T.

AU - Inoue, S.

AU - Ohtsu, M.

PY - 1998

Y1 - 1998

N2 - The optical-beam-induced resistance-change-detection (OBRICH) method which used near-field-optical-probe as heat source was investigated for high resolution 200 nm wide TiSi line. The OBRICH used laser-beam heating and resistance-change detection processes. An Ar laser was introduced to test NF-OBIRCH method into near-field optical probe and was scanned in the area of interest which used shear force feedback technique. The results show that the OBIRCH method had higher spatial resolution and the method caused by heating was observed when metallized probe was used without interference from the optical beam induced current (OBIC).

AB - The optical-beam-induced resistance-change-detection (OBRICH) method which used near-field-optical-probe as heat source was investigated for high resolution 200 nm wide TiSi line. The OBRICH used laser-beam heating and resistance-change detection processes. An Ar laser was introduced to test NF-OBIRCH method into near-field optical probe and was scanned in the area of interest which used shear force feedback technique. The results show that the OBIRCH method had higher spatial resolution and the method caused by heating was observed when metallized probe was used without interference from the optical beam induced current (OBIC).

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T2 - Proceedings of the 24th Symposium for Testing and Failure Analysis

Y2 - 15 November 1998 through 19 November 1998

ER -

High Spatial Resolution OBIRCH and OBIC Effects Realized by Near-field Optical Probe in the Analysis of High Resistance 200 nm Wide TiSi Line

Abstract

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ASJC Scopus subject areas

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