TY - JOUR
T1 - Highly nonreciprocal spin waves excited by magnetoelastic coupling in a ni / si bilayer
AU - Tateno, Shoma
AU - Nozaki, Yukio
AU - Nozaki, Yukio
N1 - Funding Information:
The authors thank Professor Mamoru Matsuo for valuable discussions. This work was partially supported by JSPS KAKENHI Grant No. JP18H03867 and JST CREST Grant No. JPMJCR19J4, Japan.
Publisher Copyright:
© 2020 American Physical Society.
PY - 2020/3
Y1 - 2020/3
N2 - We demonstrate a largely enhanced nonreciprocal propagation of spin waves (SWs) magnetoelastically excited in Ni/Si bilayer films. The nonreciprocity is attributed to the shear component of the strain tensor, which can be enlarged by increasing the thickness of the Si layer. By evaporating a 400-nm-thick Si layer on a Ni film, we enhanced the nonreciprocal ratio by up to 1200%. This finding paves the way for rectification of SWs in magnonic devices.
AB - We demonstrate a largely enhanced nonreciprocal propagation of spin waves (SWs) magnetoelastically excited in Ni/Si bilayer films. The nonreciprocity is attributed to the shear component of the strain tensor, which can be enlarged by increasing the thickness of the Si layer. By evaporating a 400-nm-thick Si layer on a Ni film, we enhanced the nonreciprocal ratio by up to 1200%. This finding paves the way for rectification of SWs in magnonic devices.
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U2 - 10.1103/PhysRevApplied.13.034074
DO - 10.1103/PhysRevApplied.13.034074
M3 - Article
AN - SCOPUS:85087591503
VL - 13
JO - Physical Review Applied
JF - Physical Review Applied
SN - 2331-7019
IS - 1
M1 - 034074
ER -