Improved abrasion resistance of silica-based CVD thin films on polycarbonate substrates for automotive applications

Sae Tanaka; Hayate Endo; Akira Shirakura; Shinya Kudo; Tetsuya Suzuki

doi:10.1116/6.0001040

Improved abrasion resistance of silica-based CVD thin films on polycarbonate substrates for automotive applications

Sae Tanaka, Hayate Endo, Akira Shirakura, Shinya Kudo, Tetsuya Suzuki

Research output: Contribution to journal › Article › peer-review

2 Citations (Scopus)

Abstract

A silica-based thin film was synthesized on polycarbonate substrates topped with acrylic primer. The synthesis was performed by chemical vapor deposition under a remote-type atmospheric pressure plasma. The source gas used was TrMS/O2, and the carrier gas used was either He or Ar. The abrasion resistance and adhesion strength were improved by changing the carrier gas from He to Ar. After a standard Taber abrasion test, the minimum change in haze value was approximately 1.3% for a sample synthesized under Ar (below the 2.0% requirement for vehicle window glass). The adhesion strength between the thin film and the substrate probably improved because of the etching effect of the primer by the Ar plasma during the deposition. The results confirmed that atmospheric remote technology can synthesize silica-based films and demonstrated that the technology is applicable to manufacturing vehicle window glass replacements.

Original language	English
Article number	040602
Journal	Journal of Vacuum Science and Technology B
Volume	39
Issue number	4
DOIs	https://doi.org/10.1116/6.0001040
Publication status	Published - 2021 Jul 1
Externally published	Yes

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Instrumentation
Process Chemistry and Technology
Surfaces, Coatings and Films
Electrical and Electronic Engineering
Materials Chemistry

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@article{73223983af5d4d19aa1a782912bab5bc,

title = "Improved abrasion resistance of silica-based CVD thin films on polycarbonate substrates for automotive applications",

abstract = "A silica-based thin film was synthesized on polycarbonate substrates topped with acrylic primer. The synthesis was performed by chemical vapor deposition under a remote-type atmospheric pressure plasma. The source gas used was TrMS/O2, and the carrier gas used was either He or Ar. The abrasion resistance and adhesion strength were improved by changing the carrier gas from He to Ar. After a standard Taber abrasion test, the minimum change in haze value was approximately 1.3% for a sample synthesized under Ar (below the 2.0% requirement for vehicle window glass). The adhesion strength between the thin film and the substrate probably improved because of the etching effect of the primer by the Ar plasma during the deposition. The results confirmed that atmospheric remote technology can synthesize silica-based films and demonstrated that the technology is applicable to manufacturing vehicle window glass replacements.",

author = "Sae Tanaka and Hayate Endo and Akira Shirakura and Shinya Kudo and Tetsuya Suzuki",

note = "Funding Information: This research was supported by the Research and Development Division of DaikyoNishikawa Co., Ltd. The author also thanks the Keio University Laboratory for providing the test service. Publisher Copyright: {\textcopyright} 2021 Author(s).",

year = "2021",

month = jul,

day = "1",

doi = "10.1116/6.0001040",

language = "English",

volume = "39",

journal = "Journal of Vacuum Science and Technology B",

issn = "2166-2746",

publisher = "AVS Science and Technology Society",

number = "4",

}

TY - JOUR

T1 - Improved abrasion resistance of silica-based CVD thin films on polycarbonate substrates for automotive applications

AU - Tanaka, Sae

AU - Endo, Hayate

AU - Shirakura, Akira

AU - Kudo, Shinya

AU - Suzuki, Tetsuya

N1 - Funding Information: This research was supported by the Research and Development Division of DaikyoNishikawa Co., Ltd. The author also thanks the Keio University Laboratory for providing the test service. Publisher Copyright: © 2021 Author(s).

PY - 2021/7/1

Y1 - 2021/7/1

N2 - A silica-based thin film was synthesized on polycarbonate substrates topped with acrylic primer. The synthesis was performed by chemical vapor deposition under a remote-type atmospheric pressure plasma. The source gas used was TrMS/O2, and the carrier gas used was either He or Ar. The abrasion resistance and adhesion strength were improved by changing the carrier gas from He to Ar. After a standard Taber abrasion test, the minimum change in haze value was approximately 1.3% for a sample synthesized under Ar (below the 2.0% requirement for vehicle window glass). The adhesion strength between the thin film and the substrate probably improved because of the etching effect of the primer by the Ar plasma during the deposition. The results confirmed that atmospheric remote technology can synthesize silica-based films and demonstrated that the technology is applicable to manufacturing vehicle window glass replacements.

AB - A silica-based thin film was synthesized on polycarbonate substrates topped with acrylic primer. The synthesis was performed by chemical vapor deposition under a remote-type atmospheric pressure plasma. The source gas used was TrMS/O2, and the carrier gas used was either He or Ar. The abrasion resistance and adhesion strength were improved by changing the carrier gas from He to Ar. After a standard Taber abrasion test, the minimum change in haze value was approximately 1.3% for a sample synthesized under Ar (below the 2.0% requirement for vehicle window glass). The adhesion strength between the thin film and the substrate probably improved because of the etching effect of the primer by the Ar plasma during the deposition. The results confirmed that atmospheric remote technology can synthesize silica-based films and demonstrated that the technology is applicable to manufacturing vehicle window glass replacements.

UR - http://www.scopus.com/inward/record.url?scp=85108310832&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85108310832&partnerID=8YFLogxK

U2 - 10.1116/6.0001040

DO - 10.1116/6.0001040

M3 - Article

AN - SCOPUS:85108310832

SN - 2166-2746

VL - 39

JO - Journal of Vacuum Science and Technology B

JF - Journal of Vacuum Science and Technology B

IS - 4

M1 - 040602

ER -

Improved abrasion resistance of silica-based CVD thin films on polycarbonate substrates for automotive applications

Abstract

ASJC Scopus subject areas

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