Abstract
In situ ambient-pressure X-ray photoelectron spectroscopy (AP-XPS) combined with resistivity measurement was performed for a Pt thin-film H2 gas sensor. We experimentally demonstrate that the chemical state of the Pt surface changes under working conditions, and it directly links to the sensing performance. Moreover, the operating principle is discussed at the atomic scale.
Original language | English |
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Pages (from-to) | 10147-10150 |
Number of pages | 4 |
Journal | Chemical Communications |
Volume | 56 |
Issue number | 70 |
DOIs | |
Publication status | Published - 2020 Sep 11 |
ASJC Scopus subject areas
- Catalysis
- Electronic, Optical and Magnetic Materials
- Ceramics and Composites
- Chemistry(all)
- Surfaces, Coatings and Films
- Metals and Alloys
- Materials Chemistry