In situ AP-XPS analysis of a Pt thin-film sensor for highly sensitive H2detection

Ryo Toyoshima; Takahisa Tanaka; Taro Kato; Ken Uchida; Hiroshi Kondoh

doi:10.1039/d0cc04030d

In situ AP-XPS analysis of a Pt thin-film sensor for highly sensitive H₂detection

Ryo Toyoshima, Takahisa Tanaka, Taro Kato, Ken Uchida, Hiroshi Kondoh

Department of Chemistry

Research output: Contribution to journal › Article › peer-review

Abstract

In situ ambient-pressure X-ray photoelectron spectroscopy (AP-XPS) combined with resistivity measurement was performed for a Pt thin-film H2 gas sensor. We experimentally demonstrate that the chemical state of the Pt surface changes under working conditions, and it directly links to the sensing performance. Moreover, the operating principle is discussed at the atomic scale. This journal is

Original language	English
Pages (from-to)	10147-10150
Number of pages	4
Journal	Chemical Communications
Volume	56
Issue number	70
DOIs	https://doi.org/10.1039/d0cc04030d
Publication status	Published - 2020 Sep 11

ASJC Scopus subject areas

Catalysis
Electronic, Optical and Magnetic Materials
Ceramics and Composites
Chemistry(all)
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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