Abstract
Molecular orientations of pentacene ultrathin films grown on SiO2 substrates were studied without the influence of the atmosphere by vacuum atomic force microscopy (V-AFM) and near edge X-ray absorption fine structure (NEXAFS). The experimental processes from deposition of pentacene to characterization of films were performed under vacuum condition without exposure to the atmosphere. V-AFM and NEXAFS measurements showed that pentacene molecules tend to grow on SiO2 surface with their molecular long axes perpendicular to the substrate surfaces (standing-mode) irrespective of preparation procedure of SiO2 substrate.
Original language | English |
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Pages (from-to) | 2518-2522 |
Number of pages | 5 |
Journal | Surface Science |
Volume | 600 |
Issue number | 12 |
DOIs | |
Publication status | Published - 2006 Jun 15 |
Externally published | Yes |
Keywords
- Aromatics
- Atomic force microscopy
- In-situ characterization
- Near edge extended X-ray absorption fine structure (NEXAFS)
- Pentacene
- Silicon oxides
- Surface structure, morphology, roughness and topography
- Thin film structures
ASJC Scopus subject areas
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Materials Chemistry