Influence of Na2Si2O5 on the Hydration of C4AF with Various Surface Areas

Kwans Suk you; Hirotaka fujimori; Koji Ioku; Seishi goto

doi:10.2472/jsms.51.6Appendix_64

Influence of Na₂Si₂O₅ on the Hydration of C4AF with Various Surface Areas

Kwans Suk you, Hirotaka fujimori, Koji Ioku, Seishi goto

Research output: Contribution to journal › Article › peer-review

Abstract

The hydration of C4AF having various surface areas was investigated with Na₂Si₂O₅ solution. The hydration behavior of C4AF depended on the amount of silicate ions precipitated on its surface. The amount of precipitated silicate ions, which hindered the hydration of C4AF, was proportional to the surface area of C4AF. The precipitated silicate ions on the surface of C4AF were founded to be a silica-like material by means of X-ray photoelectron spectroscopy (XPS). They formed a layer approximately 3 nm thick on the surface of C4AF.

Original language	English
Pages (from-to)	64-67
Number of pages	4
Journal	Zairyo/Journal of the Society of Materials Science, Japan
Volume	51
DOIs	https://doi.org/10.2472/jsms.51.6Appendix_64
Publication status	Published - 2002
Externally published	Yes

Keywords

Ferrite phase
Hydration reaction
Retardation
Silica layer
Sodium silicate
Surface area

ASJC Scopus subject areas

Materials Science(all)
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

Access to Document

10.2472/jsms.51.6Appendix_64

Cite this

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title = "Influence of Na2Si2O5 on the Hydration of C4AF with Various Surface Areas",

abstract = "The hydration of C4AF having various surface areas was investigated with Na2Si2O5 solution. The hydration behavior of C4AF depended on the amount of silicate ions precipitated on its surface. The amount of precipitated silicate ions, which hindered the hydration of C4AF, was proportional to the surface area of C4AF. The precipitated silicate ions on the surface of C4AF were founded to be a silica-like material by means of X-ray photoelectron spectroscopy (XPS). They formed a layer approximately 3 nm thick on the surface of C4AF.",

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year = "2002",

doi = "10.2472/jsms.51.6Appendix_64",

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AU - you, Kwans Suk

AU - fujimori, Hirotaka

AU - Ioku, Koji

AU - goto, Seishi

PY - 2002

Y1 - 2002

N2 - The hydration of C4AF having various surface areas was investigated with Na2Si2O5 solution. The hydration behavior of C4AF depended on the amount of silicate ions precipitated on its surface. The amount of precipitated silicate ions, which hindered the hydration of C4AF, was proportional to the surface area of C4AF. The precipitated silicate ions on the surface of C4AF were founded to be a silica-like material by means of X-ray photoelectron spectroscopy (XPS). They formed a layer approximately 3 nm thick on the surface of C4AF.

AB - The hydration of C4AF having various surface areas was investigated with Na2Si2O5 solution. The hydration behavior of C4AF depended on the amount of silicate ions precipitated on its surface. The amount of precipitated silicate ions, which hindered the hydration of C4AF, was proportional to the surface area of C4AF. The precipitated silicate ions on the surface of C4AF were founded to be a silica-like material by means of X-ray photoelectron spectroscopy (XPS). They formed a layer approximately 3 nm thick on the surface of C4AF.

KW - Ferrite phase

KW - Hydration reaction

KW - Retardation

KW - Silica layer

KW - Sodium silicate

KW - Surface area

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