New experimental evidence of the plasma structure has been presented in the rf glow discharge in SiH4 at 13.56 MHz by spatiotemporal emission spectroscopy. Theoretical estimation by the relaxation continuum model strongly supports the accumulative effect of the negative ion, SiHn-, by the electron attachment in the bulk plasma due to the potential barriers in the positive-ion sheath on the discharge structure.
|Number of pages||4|
|Journal||Physical Review A|
|Publication status||Published - 1990 Jan 1|
ASJC Scopus subject areas
- Atomic and Molecular Physics, and Optics