Investigation of dependence of power transfer on frequency in the Linac4 negative hydrogen ion source

Wakaba Kobayashi, Kenjiro Nishida, Daniel Noll, Jacques Lettry, Kazuo Hoshino, Akiyoshi Hatayama

Research output: Contribution to journalArticle

Abstract

Linac4 is radio frequency (RF) driven type negative hydrogen H- ion source. In the RF system, it is required to match the impedance between the RF-system and plasma loading. In order to match the impedance, it is essential to analyze the plasma impedance. In this study, we analyze the dependence of power transfer on the input parameters (frequency, input power and H2 gas pressure) by using the plasma impedance prediction model. The results indicate that in the case of frequency = 2MHz, which is often used in the experiment, efficient power supply is seen in the wide range of input power and H2 gas pressure. Also, if the optimum value of input power and H2 gas pressure is input, it may be possible to reduce the influence of the frequency value on the power reflection efficiency.

Original languageEnglish
Article number3401094
JournalPlasma and Fusion Research
Volume14
DOIs
Publication statusPublished - 2019 Jan 1

Fingerprint

hydrogen ions
negative ions
ion sources
impedance
gas pressure
radio frequencies
power supplies
hydrogen
predictions

Keywords

  • Equivalent circuit model
  • Impedance mathing
  • Negative ion source
  • Parameter survey
  • Plasma impedance
  • RF plasma

ASJC Scopus subject areas

  • Condensed Matter Physics

Cite this

Investigation of dependence of power transfer on frequency in the Linac4 negative hydrogen ion source. / Kobayashi, Wakaba; Nishida, Kenjiro; Noll, Daniel; Lettry, Jacques; Hoshino, Kazuo; Hatayama, Akiyoshi.

In: Plasma and Fusion Research, Vol. 14, 3401094, 01.01.2019.

Research output: Contribution to journalArticle

Kobayashi, Wakaba ; Nishida, Kenjiro ; Noll, Daniel ; Lettry, Jacques ; Hoshino, Kazuo ; Hatayama, Akiyoshi. / Investigation of dependence of power transfer on frequency in the Linac4 negative hydrogen ion source. In: Plasma and Fusion Research. 2019 ; Vol. 14.
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AU - Hatayama, Akiyoshi

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