Irreversible change in the NO adsorption state on Pt(111) under high pressure studied by AP-XPS, NEXAFS, and STM

Toru Shimada, Bongjin Simon Mun, Ikuyo F. Nakai, Atsushi Banno, Hitoshi Abe, Yasuhiro Iwasawa, Toshiaki Ohta, Hiroshi Kondoh

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Ambient pressure X-ray photoelectron spectroscopy (AP-XPS) has been applied to the investigation of NO adsorption on Pt(111) under various pressures of NO (up to 1 Torr) at room temperature. Under 10-7 Torr, molecular NO occupies the most stable fcc-hollow sites and partially occupies the energetically unfavorable atop sites. NO reversibly desorbs from the atop sites after evacuation. At NO pressures higher than 10-6 Torr, however, irreversible adsorption of atomic oxygen takes place via NO dissociation, leading to the formation of NO+O domains. This result is consistent with near-edge X-ray absorption fine structure (NEXAFS) and scanning tunneling microscopy (STM) results.

Original languageEnglish
Pages (from-to)17030-17035
Number of pages6
JournalJournal of Physical Chemistry C
Issue number40
Publication statusPublished - 2010 Oct 14


ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Energy(all)

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