Laser ablation deposition of crystalline copper-phthalocyanine thin films

E. Ina, N. Matsumoto, E. Shikada, F. Kannari

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Abstract

The poor crystallinity of copper-phthalocyanine (CuPc) thin films fabricated via KrF laser ablation is significantly improved by three different assisting methods applied during deposition: (1) elevating substrate temperature only up to 50°C; (2) irradiating with HeNe laser of ∼ 200 μW/cm 2 ; (3) applying DC electric field. Highest crystallinity is obtained when the film is deposited under DC electric field of ∼ 50 V/cm in the direction of film thickness. This in-process electric poling also works for 4-dialkylamino-4′-nitrostilbensen (DANS) film.

Original languageEnglish
Pages (from-to)574-578
Number of pages5
JournalApplied Surface Science
Volume127-129
DOIs
Publication statusPublished - 1998 May

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Keywords

  • Copper-phthalocyanine
  • Electric poling
  • Laser ablation deposition
  • Organic thin films

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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