Laser ablation deposition of crystalline copper-phthalocyanine thin films

E. Ina, N. Matsumoto, E. Shikada, F. Kannari

    Research output: Contribution to journalArticle

    26 Citations (Scopus)

    Abstract

    The poor crystallinity of copper-phthalocyanine (CuPc) thin films fabricated via KrF laser ablation is significantly improved by three different assisting methods applied during deposition: (1) elevating substrate temperature only up to 50°C; (2) irradiating with HeNe laser of ∼ 200 μW/cm 2 ; (3) applying DC electric field. Highest crystallinity is obtained when the film is deposited under DC electric field of ∼ 50 V/cm in the direction of film thickness. This in-process electric poling also works for 4-dialkylamino-4′-nitrostilbensen (DANS) film.

    Original languageEnglish
    Pages (from-to)574-578
    Number of pages5
    JournalApplied Surface Science
    Volume127-129
    DOIs
    Publication statusPublished - 1998 May

    Keywords

    • Copper-phthalocyanine
    • Electric poling
    • Laser ablation deposition
    • Organic thin films

    ASJC Scopus subject areas

    • Chemistry(all)
    • Condensed Matter Physics
    • Physics and Astronomy(all)
    • Surfaces and Interfaces
    • Surfaces, Coatings and Films

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