Liquid phase deposition film of tin oxide

Koji Tsukuma, Tomoyuki Akiyama, Hiroaki Imai

Research output: Contribution to journalArticle

84 Citations (Scopus)

Abstract

The thin film of tin oxide was formed in the solution containing 0.005-0.3 mol/1 SnF2. The procedure of film formation was very simple; the solution, in which a substrate is immersed, is maintained above 40°C for tens of hours. In this method, the hydrolysis product of SnF2 deposited as the film on a substrate. As-deposition film included 6-16 mol% fluorine. The chemical component was deduced as SnO2-05xFx, where 0.17 < × < 0.5. The film was modified to pure SnO2 by heating above 300°C. The electrical conductivity was improved to 1.4 × 10-2 Ω cm by heating at 500°C. The model of liquid phase deposition was proposed to extend another oxide film.

Original languageEnglish
Pages (from-to)48-54
Number of pages7
JournalJournal of Non-Crystalline Solids
Volume210
Issue number1
Publication statusPublished - 1997 Feb

Fingerprint

Tin oxides
tin oxides
liquid phases
Liquids
Heating
heating
Fluorine
Substrates
Oxide films
fluorine
oxide films
hydrolysis
Hydrolysis
Thin films
electrical resistivity
stannic oxide
products
thin films

ASJC Scopus subject areas

  • Ceramics and Composites
  • Electronic, Optical and Magnetic Materials

Cite this

Liquid phase deposition film of tin oxide. / Tsukuma, Koji; Akiyama, Tomoyuki; Imai, Hiroaki.

In: Journal of Non-Crystalline Solids, Vol. 210, No. 1, 02.1997, p. 48-54.

Research output: Contribution to journalArticle

Tsukuma, K, Akiyama, T & Imai, H 1997, 'Liquid phase deposition film of tin oxide', Journal of Non-Crystalline Solids, vol. 210, no. 1, pp. 48-54.
Tsukuma, Koji ; Akiyama, Tomoyuki ; Imai, Hiroaki. / Liquid phase deposition film of tin oxide. In: Journal of Non-Crystalline Solids. 1997 ; Vol. 210, No. 1. pp. 48-54.
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