Liquid phase deposition of a film of silica with an organic functional group

Koji Tsukuma, Tomoyuki Akiyama, Nobusuke Yamada, Hiroaki Imai

Research output: Contribution to journalArticle

17 Citations (Scopus)

Abstract

The thin films of silica with an organic functional group, -CH3,-CH=CH2, -C2H4CF3, were produced by a deposition method. In this method, the film was formed on a substrate in a solution above room temperature. The dilute solution containing organotrimethoxysilane (Si concentration 0.03 mol/1) was utilized. The addition of NH4F promoted the film growth. The deposition film was not formed in the solution containing tetramethoxysilane. Therefore, it is assumed that the role of organic functional group is important in initiating the deposition process.

Original languageEnglish
Pages (from-to)161-168
Number of pages8
JournalJournal of Non-Crystalline Solids
Volume231
Issue number1-2
DOIs
Publication statusPublished - 1998 Jul 1

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Ceramics and Composites
  • Condensed Matter Physics
  • Materials Chemistry

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