Abstract
The thin films of silica with an organic functional group, -CH3,-CH=CH2, -C2H4CF3, were produced by a deposition method. In this method, the film was formed on a substrate in a solution above room temperature. The dilute solution containing organotrimethoxysilane (Si concentration 0.03 mol/1) was utilized. The addition of NH4F promoted the film growth. The deposition film was not formed in the solution containing tetramethoxysilane. Therefore, it is assumed that the role of organic functional group is important in initiating the deposition process.
| Original language | English |
|---|---|
| Pages (from-to) | 161-168 |
| Number of pages | 8 |
| Journal | Journal of Non-Crystalline Solids |
| Volume | 231 |
| Issue number | 1-2 |
| Publication status | Published - 1998 Jul 1 |
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ASJC Scopus subject areas
- Ceramics and Composites
- Electronic, Optical and Magnetic Materials
Cite this
Liquid phase deposition of a film of silica with an organic functional group. / Tsukuma, Koji; Akiyama, Tomoyuki; Yamada, Nobusuke; Imai, Hiroaki.
In: Journal of Non-Crystalline Solids, Vol. 231, No. 1-2, 01.07.1998, p. 161-168.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Liquid phase deposition of a film of silica with an organic functional group
AU - Tsukuma, Koji
AU - Akiyama, Tomoyuki
AU - Yamada, Nobusuke
AU - Imai, Hiroaki
PY - 1998/7/1
Y1 - 1998/7/1
N2 - The thin films of silica with an organic functional group, -CH3,-CH=CH2, -C2H4CF3, were produced by a deposition method. In this method, the film was formed on a substrate in a solution above room temperature. The dilute solution containing organotrimethoxysilane (Si concentration 0.03 mol/1) was utilized. The addition of NH4F promoted the film growth. The deposition film was not formed in the solution containing tetramethoxysilane. Therefore, it is assumed that the role of organic functional group is important in initiating the deposition process.
AB - The thin films of silica with an organic functional group, -CH3,-CH=CH2, -C2H4CF3, were produced by a deposition method. In this method, the film was formed on a substrate in a solution above room temperature. The dilute solution containing organotrimethoxysilane (Si concentration 0.03 mol/1) was utilized. The addition of NH4F promoted the film growth. The deposition film was not formed in the solution containing tetramethoxysilane. Therefore, it is assumed that the role of organic functional group is important in initiating the deposition process.
UR - http://www.scopus.com/inward/record.url?scp=0032123095&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0032123095&partnerID=8YFLogxK
M3 - Article
VL - 231
SP - 161
EP - 168
JO - Journal of Non-Crystalline Solids
JF - Journal of Non-Crystalline Solids
SN - 0022-3093
IS - 1-2
ER -