Liquid phase deposition of a film of silica with an organic functional group

Koji Tsukuma; Tomoyuki Akiyama; Nobusuke Yamada; Hiroaki Imai

doi:10.1016/S0022-3093(98)00440-2

Liquid phase deposition of a film of silica with an organic functional group

Koji Tsukuma, Tomoyuki Akiyama, Nobusuke Yamada, Hiroaki Imai

Department of Applied Chemistry

Research output: Contribution to journal › Article › peer-review

17 Citations (Scopus)

Abstract

The thin films of silica with an organic functional group, -CH₃,-CH=CH₂, -C₂H₄CF₃, were produced by a deposition method. In this method, the film was formed on a substrate in a solution above room temperature. The dilute solution containing organotrimethoxysilane (Si concentration 0.03 mol/1) was utilized. The addition of NH₄F promoted the film growth. The deposition film was not formed in the solution containing tetramethoxysilane. Therefore, it is assumed that the role of organic functional group is important in initiating the deposition process.

Original language	English
Pages (from-to)	161-168
Number of pages	8
Journal	Journal of Non-Crystalline Solids
Volume	231
Issue number	1-2
DOIs	https://doi.org/10.1016/S0022-3093(98)00440-2
Publication status	Published - 1998 Jul 1

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Ceramics and Composites
Condensed Matter Physics
Materials Chemistry

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abstract = "The thin films of silica with an organic functional group, -CH3,-CH=CH2, -C2H4CF3, were produced by a deposition method. In this method, the film was formed on a substrate in a solution above room temperature. The dilute solution containing organotrimethoxysilane (Si concentration 0.03 mol/1) was utilized. The addition of NH4F promoted the film growth. The deposition film was not formed in the solution containing tetramethoxysilane. Therefore, it is assumed that the role of organic functional group is important in initiating the deposition process.",

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AU - Akiyama, Tomoyuki

AU - Yamada, Nobusuke

AU - Imai, Hiroaki

PY - 1998/7/1

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N2 - The thin films of silica with an organic functional group, -CH3,-CH=CH2, -C2H4CF3, were produced by a deposition method. In this method, the film was formed on a substrate in a solution above room temperature. The dilute solution containing organotrimethoxysilane (Si concentration 0.03 mol/1) was utilized. The addition of NH4F promoted the film growth. The deposition film was not formed in the solution containing tetramethoxysilane. Therefore, it is assumed that the role of organic functional group is important in initiating the deposition process.

AB - The thin films of silica with an organic functional group, -CH3,-CH=CH2, -C2H4CF3, were produced by a deposition method. In this method, the film was formed on a substrate in a solution above room temperature. The dilute solution containing organotrimethoxysilane (Si concentration 0.03 mol/1) was utilized. The addition of NH4F promoted the film growth. The deposition film was not formed in the solution containing tetramethoxysilane. Therefore, it is assumed that the role of organic functional group is important in initiating the deposition process.

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Liquid phase deposition of a film of silica with an organic functional group

Abstract

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