Liquid phase deposition of a film of silica with an organic functional group

Koji Tsukuma, Tomoyuki Akiyama, Nobusuke Yamada, Hiroaki Imai

Research output: Contribution to journalArticle

17 Citations (Scopus)

Abstract

The thin films of silica with an organic functional group, -CH3,-CH=CH2, -C2H4CF3, were produced by a deposition method. In this method, the film was formed on a substrate in a solution above room temperature. The dilute solution containing organotrimethoxysilane (Si concentration 0.03 mol/1) was utilized. The addition of NH4F promoted the film growth. The deposition film was not formed in the solution containing tetramethoxysilane. Therefore, it is assumed that the role of organic functional group is important in initiating the deposition process.

Original languageEnglish
Pages (from-to)161-168
Number of pages8
JournalJournal of Non-Crystalline Solids
Volume231
Issue number1-2
Publication statusPublished - 1998 Jul 1

Fingerprint

Silicon Dioxide
Functional groups
liquid phases
Silica
silicon dioxide
Liquids
Film growth
methylidyne
Thin films
room temperature
Substrates
thin films
Temperature
tetramethoxysilane

ASJC Scopus subject areas

  • Ceramics and Composites
  • Electronic, Optical and Magnetic Materials

Cite this

Liquid phase deposition of a film of silica with an organic functional group. / Tsukuma, Koji; Akiyama, Tomoyuki; Yamada, Nobusuke; Imai, Hiroaki.

In: Journal of Non-Crystalline Solids, Vol. 231, No. 1-2, 01.07.1998, p. 161-168.

Research output: Contribution to journalArticle

Tsukuma, Koji ; Akiyama, Tomoyuki ; Yamada, Nobusuke ; Imai, Hiroaki. / Liquid phase deposition of a film of silica with an organic functional group. In: Journal of Non-Crystalline Solids. 1998 ; Vol. 231, No. 1-2. pp. 161-168.
@article{2211166cf8af4c51bf9dd6c824a0d329,
title = "Liquid phase deposition of a film of silica with an organic functional group",
abstract = "The thin films of silica with an organic functional group, -CH3,-CH=CH2, -C2H4CF3, were produced by a deposition method. In this method, the film was formed on a substrate in a solution above room temperature. The dilute solution containing organotrimethoxysilane (Si concentration 0.03 mol/1) was utilized. The addition of NH4F promoted the film growth. The deposition film was not formed in the solution containing tetramethoxysilane. Therefore, it is assumed that the role of organic functional group is important in initiating the deposition process.",
author = "Koji Tsukuma and Tomoyuki Akiyama and Nobusuke Yamada and Hiroaki Imai",
year = "1998",
month = "7",
day = "1",
language = "English",
volume = "231",
pages = "161--168",
journal = "Journal of Non-Crystalline Solids",
issn = "0022-3093",
publisher = "Elsevier",
number = "1-2",

}

TY - JOUR

T1 - Liquid phase deposition of a film of silica with an organic functional group

AU - Tsukuma, Koji

AU - Akiyama, Tomoyuki

AU - Yamada, Nobusuke

AU - Imai, Hiroaki

PY - 1998/7/1

Y1 - 1998/7/1

N2 - The thin films of silica with an organic functional group, -CH3,-CH=CH2, -C2H4CF3, were produced by a deposition method. In this method, the film was formed on a substrate in a solution above room temperature. The dilute solution containing organotrimethoxysilane (Si concentration 0.03 mol/1) was utilized. The addition of NH4F promoted the film growth. The deposition film was not formed in the solution containing tetramethoxysilane. Therefore, it is assumed that the role of organic functional group is important in initiating the deposition process.

AB - The thin films of silica with an organic functional group, -CH3,-CH=CH2, -C2H4CF3, were produced by a deposition method. In this method, the film was formed on a substrate in a solution above room temperature. The dilute solution containing organotrimethoxysilane (Si concentration 0.03 mol/1) was utilized. The addition of NH4F promoted the film growth. The deposition film was not formed in the solution containing tetramethoxysilane. Therefore, it is assumed that the role of organic functional group is important in initiating the deposition process.

UR - http://www.scopus.com/inward/record.url?scp=0032123095&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0032123095&partnerID=8YFLogxK

M3 - Article

AN - SCOPUS:0032123095

VL - 231

SP - 161

EP - 168

JO - Journal of Non-Crystalline Solids

JF - Journal of Non-Crystalline Solids

SN - 0022-3093

IS - 1-2

ER -