Local structure of AgOx thin layers generating optical near-field

A. V. Kolobov, D. Buechel, P. Fons, J. Tominaga

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Discovery of near-field generation by plasmons excited in thin AgOx layers made them important components in advanced optical technologies such as Super-RENS (H. Fuji et al, Jpn. J. Appl. Phys., vol. 39, p. 980, 2000) and the purely optical photonic transistor (J. Tominaga et al, Appl. Phys. Lett., vol. 78, p. 2417, 2001). In order to unravel the nanometer-scale mechanism of the silver nanoparticle formation upon photo-induced decomposition of the AgOx layer and its relationship with the plasmon generation efficiency, knowledge of the local structure of as-deposited AgOx layers and its modification upon thermal annealing and optical initialization is of utmost importance. A unique technique which allows determination of the local structure with atomic selectivity in both crystalline and amorphous states is X-ray absorption fine structure (XAFS) spectroscopy. In this paper, we present the results of the first such study applied to AgOx thin layers.

Original languageEnglish
Title of host publication2002 International Symposium on Optical Memory and Optical Data Storage Topical Meeting, ISOM/ODS 2002 - Joint International Symposium on Optical Memory and Optical Data Storage 2002, Technical Digest
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages207-209
Number of pages3
ISBN (Electronic)0780373790, 9780780373792
DOIs
Publication statusPublished - 2002 Jan 1
Externally publishedYes
EventInternational Symposium on Optical Memory and Optical Data Storage Topical Meeting, ISOM/ODS 2002 - Joint International Symposium on Optical Memory and Optical Data Storage 2002 - Waikoloa, United States
Duration: 2002 Jul 72002 Jul 11

Publication series

Name2002 International Symposium on Optical Memory and Optical Data Storage Topical Meeting, ISOM/ODS 2002 - Joint International Symposium on Optical Memory and Optical Data Storage 2002, Technical Digest

Conference

ConferenceInternational Symposium on Optical Memory and Optical Data Storage Topical Meeting, ISOM/ODS 2002 - Joint International Symposium on Optical Memory and Optical Data Storage 2002
CountryUnited States
CityWaikoloa
Period02/7/702/7/11

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electronic, Optical and Magnetic Materials

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    Kolobov, A. V., Buechel, D., Fons, P., & Tominaga, J. (2002). Local structure of AgOx thin layers generating optical near-field. In 2002 International Symposium on Optical Memory and Optical Data Storage Topical Meeting, ISOM/ODS 2002 - Joint International Symposium on Optical Memory and Optical Data Storage 2002, Technical Digest (pp. 207-209). [1028617] (2002 International Symposium on Optical Memory and Optical Data Storage Topical Meeting, ISOM/ODS 2002 - Joint International Symposium on Optical Memory and Optical Data Storage 2002, Technical Digest). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/OMODS.2002.1028617