Low-crosstalk offset crossing waveguide fabricated on SOI substrates

D. Tanaka, Y. Shoji, K. Kintaka, H. Kawashima, Y. Ikuma, H. Tsuda

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    2 Citations (Scopus)

    Abstract

    The offset crossing waveguide was proposed and fabricated on silicon-on-insulator (SOI) substrates. We successfully achieved the low-crosstalk offset crossing waveguide which had a crosstalk of less than -50 dB.

    Original languageEnglish
    Title of host publicationTechnical Digest - 15th OptoElectronics and Communications Conference, OECC2010
    Pages870-871
    Number of pages2
    Publication statusPublished - 2010 Nov 29
    Event15th OptoElectronics and Communications Conference, OECC2010 - Sapporo, Japan
    Duration: 2010 Jul 52010 Jul 9

    Publication series

    NameTechnical Digest - 15th OptoElectronics and Communications Conference, OECC2010

    Other

    Other15th OptoElectronics and Communications Conference, OECC2010
    CountryJapan
    CitySapporo
    Period10/7/510/7/9

    ASJC Scopus subject areas

    • Electrical and Electronic Engineering

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  • Cite this

    Tanaka, D., Shoji, Y., Kintaka, K., Kawashima, H., Ikuma, Y., & Tsuda, H. (2010). Low-crosstalk offset crossing waveguide fabricated on SOI substrates. In Technical Digest - 15th OptoElectronics and Communications Conference, OECC2010 (pp. 870-871). [5588454] (Technical Digest - 15th OptoElectronics and Communications Conference, OECC2010).