Low-crosstalk offset crossing waveguide fabricated on SOI substrates

D. Tanaka, Y. Shoji, K. Kintaka, H. Kawashima, Y. Ikuma, Hiroyuki Tsuda

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

The offset crossing waveguide was proposed and fabricated on silicon-on-insulator (SOI) substrates. We successfully achieved the low-crosstalk offset crossing waveguide which had a crosstalk of less than -50 dB.

Original languageEnglish
Title of host publicationTechnical Digest - 15th OptoElectronics and Communications Conference, OECC2010
Pages870-871
Number of pages2
Publication statusPublished - 2010
Event15th OptoElectronics and Communications Conference, OECC2010 - Sapporo, Japan
Duration: 2010 Jul 52010 Jul 9

Other

Other15th OptoElectronics and Communications Conference, OECC2010
CountryJapan
CitySapporo
Period10/7/510/7/9

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ASJC Scopus subject areas

  • Electrical and Electronic Engineering

Cite this

Tanaka, D., Shoji, Y., Kintaka, K., Kawashima, H., Ikuma, Y., & Tsuda, H. (2010). Low-crosstalk offset crossing waveguide fabricated on SOI substrates. In Technical Digest - 15th OptoElectronics and Communications Conference, OECC2010 (pp. 870-871). [5588454]