Magnetic mesa structures fabricated by reactive ion etching with CO/NH 3/Xe plasma chemistry for an all-silicon quantum computer

Dong F. Wang, Atsushi Takahashi, Yoshinori Matsumoto, Kohei M Itoh, Yoshihisa Yamamoto, Takahito Ono, Masayoshi Esashi

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

Micromachining of magnetic materials is becoming a crucial technology for future magnetic systems/devices such as high-density magnetic recording heads, high-density patterned media, magnetic quantum devices, and micro-magnetic smart systems. NiFe alloy, one of the typical ferromagnetic materials, can be deposited and fabricated using current thin film and micromachining technologies, and it has found various applications in microsensors, microactuators, and microsystems. In our recent work, Ni45Fe 55 alloy with the highest saturation magnetic-flux density was selected as the micro-magnet for an all-silicon quantum computer. The micro-magnet was designed to create a large magnetic field gradient and to distinguish 29Si nuclear spins arranged as chains in a 28Si matrix with Larmor frequencies. This paper reports the micromachining of a Ni45Fe55 alloy mesa structure for an all-silicon quantum computer and the preliminary evaluation of its effectiveness using a magnetic force microscope (MFM) and a superconducting quantum interference device (SQUID).

Original languageEnglish
Pages (from-to)990-994
Number of pages5
JournalNanotechnology
Volume16
Issue number6
DOIs
Publication statusPublished - 2005 Jun 1

Fingerprint

plasma chemistry
Quantum computers
quantum computers
Magnetic structure
Reactive ion etching
Micromachining
mesas
Silicon
Carbon Monoxide
micromachining
etching
Plasmas
Magnets
silicon
magnets
Microactuators
recording heads
Microsensors
ions
Ferromagnetic materials

ASJC Scopus subject areas

  • Engineering (miscellaneous)
  • Materials Science(all)
  • Physics and Astronomy (miscellaneous)

Cite this

Magnetic mesa structures fabricated by reactive ion etching with CO/NH 3/Xe plasma chemistry for an all-silicon quantum computer. / Wang, Dong F.; Takahashi, Atsushi; Matsumoto, Yoshinori; Itoh, Kohei M; Yamamoto, Yoshihisa; Ono, Takahito; Esashi, Masayoshi.

In: Nanotechnology, Vol. 16, No. 6, 01.06.2005, p. 990-994.

Research output: Contribution to journalArticle

Wang, Dong F. ; Takahashi, Atsushi ; Matsumoto, Yoshinori ; Itoh, Kohei M ; Yamamoto, Yoshihisa ; Ono, Takahito ; Esashi, Masayoshi. / Magnetic mesa structures fabricated by reactive ion etching with CO/NH 3/Xe plasma chemistry for an all-silicon quantum computer. In: Nanotechnology. 2005 ; Vol. 16, No. 6. pp. 990-994.
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