Magnetic mesa structures fabricated by reactive ion etching with CO/NH 3/Xe plasma chemistry for an all-silicon quantum computer

Dong F. Wang, Atsushi Takahashi, Yoshinori Matsumoto, Kohei M. Itoh, Yoshihisa Yamamoto, Takahito Ono, Masayoshi Esashi

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7 Citations (Scopus)

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Engineering & Materials Science

Chemical Compounds