Mechanical polishing technique for carbon nanotube interconnects in ULSIs

Masahiro Horibe, Mizuhisa Nihei, Daiyu Kondo, Akio Kawabata, Yuji Awano

    Research output: Contribution to journalArticlepeer-review

    21 Citations (Scopus)

    Abstract

    We examined a mechanical polishing technique for multiwalled carbon nanotube (MWNT) vias. This polishing technique involved the use of diamond particles fixing MWNT protrusions of the samples. The 1-μm-high outthrust MWNTs were polished, and then flat sample surfaces were obtained by controlling polishing pressure and polishing time. A cross-sectional image of a cut MWNT was obtained by high-resolution scanning electron microscopy. Mechanically polished MWNT interconnects with a high current density and a low resistance were developed.

    Original languageEnglish
    Pages (from-to)6499-6502
    Number of pages4
    JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
    Volume43
    Issue number9 A
    DOIs
    Publication statusPublished - 2004 Sep 1

    Keywords

    • Diamond particles
    • Future ultralarge scale integrated (ULSI) circuits
    • Interconnects
    • Mechanical polishing technique
    • Multiwalled carbon nanotube (MWNT)

    ASJC Scopus subject areas

    • Engineering(all)
    • Physics and Astronomy(all)

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