Mechanical polishing technique for carbon nanotube interconnects in ULSIs

Masahiro Horibe, Mizuhisa Nihei, Daiyu Kondo, Akio Kawabata, Yuji Awano

Research output: Contribution to journalArticle

21 Citations (Scopus)

Abstract

We examined a mechanical polishing technique for multiwalled carbon nanotube (MWNT) vias. This polishing technique involved the use of diamond particles fixing MWNT protrusions of the samples. The 1-μm-high outthrust MWNTs were polished, and then flat sample surfaces were obtained by controlling polishing pressure and polishing time. A cross-sectional image of a cut MWNT was obtained by high-resolution scanning electron microscopy. Mechanically polished MWNT interconnects with a high current density and a low resistance were developed.

Original languageEnglish
Pages (from-to)6499-6502
Number of pages4
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume43
Issue number9 A
DOIs
Publication statusPublished - 2004 Sep
Externally publishedYes

Fingerprint

Multiwalled carbon nanotubes (MWCN)
Polishing
polishing
Carbon nanotubes
carbon nanotubes
High resolution electron microscopy
low resistance
fixing
high current
Diamonds
Current density
diamonds
current density
Scanning electron microscopy
scanning electron microscopy
high resolution

Keywords

  • Diamond particles
  • Future ultralarge scale integrated (ULSI) circuits
  • Interconnects
  • Mechanical polishing technique
  • Multiwalled carbon nanotube (MWNT)

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Mechanical polishing technique for carbon nanotube interconnects in ULSIs. / Horibe, Masahiro; Nihei, Mizuhisa; Kondo, Daiyu; Kawabata, Akio; Awano, Yuji.

In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Vol. 43, No. 9 A, 09.2004, p. 6499-6502.

Research output: Contribution to journalArticle

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