Mechanical polishing technique for carbon nanotube interconnects in ULSIs

Masahiro Horibe, Mizuhisa Nihei, Daiyu Kondo, Akio Kawabata, Yuji Awano

Research output: Contribution to journalArticlepeer-review

21 Citations (Scopus)


We examined a mechanical polishing technique for multiwalled carbon nanotube (MWNT) vias. This polishing technique involved the use of diamond particles fixing MWNT protrusions of the samples. The 1-μm-high outthrust MWNTs were polished, and then flat sample surfaces were obtained by controlling polishing pressure and polishing time. A cross-sectional image of a cut MWNT was obtained by high-resolution scanning electron microscopy. Mechanically polished MWNT interconnects with a high current density and a low resistance were developed.

Original languageEnglish
Pages (from-to)6499-6502
Number of pages4
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Issue number9 A
Publication statusPublished - 2004 Sept
Externally publishedYes


  • Diamond particles
  • Future ultralarge scale integrated (ULSI) circuits
  • Interconnects
  • Mechanical polishing technique
  • Multiwalled carbon nanotube (MWNT)

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)


Dive into the research topics of 'Mechanical polishing technique for carbon nanotube interconnects in ULSIs'. Together they form a unique fingerprint.

Cite this