TY - JOUR
T1 - Mechanism of mid-spatial-frequency waviness removal by viscoelastic polishing tool
AU - Zhu, Wu Le
AU - Pakenham-Walsh, Oliver
AU - Copson, Kathryn
AU - Charlton, Phillip
AU - Tatsumi, Kazuya
AU - Ju, Bing Feng
AU - Beaucamp, Anthony
N1 - Funding Information:
This work was supported by the Grant-in-Aid for Scientific Research No. 20K04192 from the Japan Society for Promotion of Science, National Key R&D Program of China No. 2021YFB3400300 and National Science Foundation of China No. 52175439. The authors also acknowledge kind support from Zeeko KK. Japan.
Publisher Copyright:
© 2022 CIRP
PY - 2022/1
Y1 - 2022/1
N2 - Nanoscale roughness with ultra-precise form control can be readily achieved using compliant finishing methods such as bonnet polishing. However, their weak point lies in the difficulty of removing mid-spatial-frequency (MSF) waviness in the typical range from 0.1 to 5.0 mm wavelength. To overcome this shortcoming, a bonnet tool filled with viscoelastic fluid is developed and a comprehensive model is established to disclose its distinct removal behavior in the MSF range. The model considers tool viscoelasticity, stress distribution and workpiece topography. Experiments show high consistency with theoretical predictions, and show that MSF waviness can be effectively reduced using the proposed method.
AB - Nanoscale roughness with ultra-precise form control can be readily achieved using compliant finishing methods such as bonnet polishing. However, their weak point lies in the difficulty of removing mid-spatial-frequency (MSF) waviness in the typical range from 0.1 to 5.0 mm wavelength. To overcome this shortcoming, a bonnet tool filled with viscoelastic fluid is developed and a comprehensive model is established to disclose its distinct removal behavior in the MSF range. The model considers tool viscoelasticity, stress distribution and workpiece topography. Experiments show high consistency with theoretical predictions, and show that MSF waviness can be effectively reduced using the proposed method.
KW - Mid-spatial-frequency error
KW - Polishing
KW - Ultra precision
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U2 - 10.1016/j.cirp.2022.04.056
DO - 10.1016/j.cirp.2022.04.056
M3 - Article
AN - SCOPUS:85130904627
SN - 0007-8506
VL - 71
SP - 269
EP - 272
JO - CIRP Annals - Manufacturing Technology
JF - CIRP Annals - Manufacturing Technology
IS - 1
ER -