Mechanism of N + NO Reaction on Rh(111) surfaces: A precursor-mediated reaction

Ikuyo Nakai, Hiroshi Kondoh, Toru Shimada, Masanari Nagasaka, Reona Yokota, Tetsuo Katayama, Kenta Amemiya, Hideo Orita, Toshiaki Ohta

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Abstract

We studied the mechanism of the N + NO reaction on Rh(111) surfaces by means of near edge X-ray absorption fine structure (NEXAFS) spectroscopy. Atomic nitrogen layers on Rh(111) were titrated with NO at various temperatures. Below 350 K, the chemisorbed NO monomer does not react with N, while the NO dimer formed in the second layer acts as an extrinsic precursor to the reaction: N(a) + (NO)2(a)→N2O(g) + NO(a). Because of a dominant role of the precursor-mediated mechanism, the reaction proceeds slower with an increase in temperature. Above 350 K, the reaction switches to a different path: N(a) + NO(a) → N2(g) + O(a). ?.

Original languageEnglish
Pages (from-to)13257-13265
Number of pages9
JournalJournal of Physical Chemistry C
Volume113
Issue number30
DOIs
Publication statusPublished - 2009 Jul 30

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ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Energy(all)
  • Physical and Theoretical Chemistry
  • Surfaces, Coatings and Films

Cite this

Nakai, I., Kondoh, H., Shimada, T., Nagasaka, M., Yokota, R., Katayama, T., Amemiya, K., Orita, H., & Ohta, T. (2009). Mechanism of N + NO Reaction on Rh(111) surfaces: A precursor-mediated reaction. Journal of Physical Chemistry C, 113(30), 13257-13265. https://doi.org/10.1021/jp902583x