Mechanism of negative ion production in a cesium seeded ion source

Takatoshi Morishita, Mieko Kashiwagi, Masaya Hanada, Yoshikazu Okumura, Kazuhiro Watanabe, Akiyoshi Hatayama, Masatada Ogasawara

Research output: Contribution to journalArticle

16 Citations (Scopus)

Abstract

The production mechanism of negative ions has been investigated experimentally in a cesium seeded volume type negative ion source. The cesium light emission intensity, Cs ion volume density, plasma parameters, H- current, and work function of the plasma grid were measured. The change in plasma parameters was small even in a high Cs ion density region(up to 1012 cm-3) which was also confirmed by zero-dimensional simulation. Upon heating the plasma grid, the work function decreased and the negative ion current increased to become three times larger than that of the low plasma grid temperature condition. This increase was in good agreement with the decrease of the work function of the plasma grid surface. Therefore, it is considered that the Cs contribution for the negative ion production is the surface effect in the negative ion source.

Original languageEnglish
Pages (from-to)4709-4714
Number of pages6
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume40
Issue number7
Publication statusPublished - 2001 Jul 1

Keywords

  • Cs effect
  • Electron cooling
  • Surface production
  • Volume negative ion source
  • Volume production
  • Work function

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Fingerprint Dive into the research topics of 'Mechanism of negative ion production in a cesium seeded ion source'. Together they form a unique fingerprint.

Cite this