TY - JOUR
T1 - Micro-hardness, microstructures and thermal stability of (Ti,Cr,Al,Si)N films deposited by cathodic arc method
AU - Ezura, H.
AU - Ichijo, K.
AU - Hasegawa, H.
AU - Yamamoto, K.
AU - Hotta, A.
AU - Suzuki, T.
N1 - Funding Information:
This work was supported by Grant-in-Aid for the 21st Century COE program “KEIO Life-Conjugated Chemistry” and Japan Society for the Promotion of Science from the Ministry of Education, Culture, Sports, Science and Technology, Japan.
PY - 2008/1/8
Y1 - 2008/1/8
N2 - (Ti,Cr,Al,Si)N films were deposited by cathodic arc method using TiCrAlSi alloy cathodes. It was found that the microstructures of (Ti,Cr,Al,Si)N were closely related to (Al+Si) content. The crystal structure of (Ti,Cr,Al,Si)N was NaCl-type structure up to the (Al+Si) content of 0.60, where it changed to a hexagonal structure. The maximum hardness of 33 GPa was obtained at the lowest (Al+Si) content of 0.56, still in the cubic structure. The micro-hardness decreased down to 28 GPa as the crystal structure changed from NaCl-type to wurtzite-type. To investigate the thermal stabilities of (Ti,Cr,Al,Si)N, the films were annealed in a vacuum furnace. In Ti0.20Cr0.20Al0.55Si0.05N with cubic structure, the phase segregation occurred by annealing at over 900 °C, while Ti0.22Cr0.22Al0.44Si0.12N remained in cubic phase up to 1000 °C. The micro-hardness of Ti0.20Cr0.20Al0.55Si0.05N increased and that of Ti0.22Cr0.22Al0.44Si0.12N decreased at 1000 °C. Ti0.20Cr0.11Al0.58Si0.11N with a cubic and hexagonal mixture phase held its (c,h)-mixture phase up to 1000 °C, while there was an indication of an increase both in micro-hardness and in cubic ratio after annealing. In this paper, the micro-hardness and microstructure of (Ti,Cr,Al,Si)N are discussed as a function of annealing temperature and investigated by X-ray diffraction and electron microscopy.
AB - (Ti,Cr,Al,Si)N films were deposited by cathodic arc method using TiCrAlSi alloy cathodes. It was found that the microstructures of (Ti,Cr,Al,Si)N were closely related to (Al+Si) content. The crystal structure of (Ti,Cr,Al,Si)N was NaCl-type structure up to the (Al+Si) content of 0.60, where it changed to a hexagonal structure. The maximum hardness of 33 GPa was obtained at the lowest (Al+Si) content of 0.56, still in the cubic structure. The micro-hardness decreased down to 28 GPa as the crystal structure changed from NaCl-type to wurtzite-type. To investigate the thermal stabilities of (Ti,Cr,Al,Si)N, the films were annealed in a vacuum furnace. In Ti0.20Cr0.20Al0.55Si0.05N with cubic structure, the phase segregation occurred by annealing at over 900 °C, while Ti0.22Cr0.22Al0.44Si0.12N remained in cubic phase up to 1000 °C. The micro-hardness of Ti0.20Cr0.20Al0.55Si0.05N increased and that of Ti0.22Cr0.22Al0.44Si0.12N decreased at 1000 °C. Ti0.20Cr0.11Al0.58Si0.11N with a cubic and hexagonal mixture phase held its (c,h)-mixture phase up to 1000 °C, while there was an indication of an increase both in micro-hardness and in cubic ratio after annealing. In this paper, the micro-hardness and microstructure of (Ti,Cr,Al,Si)N are discussed as a function of annealing temperature and investigated by X-ray diffraction and electron microscopy.
KW - (Ti,Cr,Al,Si)N
KW - Cutting tools
KW - PVD
KW - Thermal stability
KW - Thin films
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U2 - 10.1016/j.vacuum.2007.07.048
DO - 10.1016/j.vacuum.2007.07.048
M3 - Article
AN - SCOPUS:37049028118
SN - 0042-207X
VL - 82
SP - 476
EP - 481
JO - Vacuum
JF - Vacuum
IS - 5
ER -