Microhardness and lattice parameter of Cr1-xAlxN films

Masahiro Kawate, Ayako Kimura, Tetsuya Suzuki

Research output: Contribution to journalArticle

89 Citations (Scopus)

Abstract

Eight kinds of targets with differing Al contents were used to synthesize Cr1-xAlxN films by the arc ion plating (AIP) method. Investigation of microhardness, microstructures, and lattice parameters of films was done by changing x values and analyzed by x-ray diffraction (XRD) method and scanning electron microscopy (SEM). Cross-sectional SEM observation of films showed that for all Cr1-xAlxN films, deposited for 20 min, microstructure drastically changed between x = 0.6 and 0.7, and had similar thickness of 5 to 6 μm.

Original languageEnglish
Pages (from-to)569-571
Number of pages3
JournalJournal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films
Volume20
Issue number2
DOIs
Publication statusPublished - 2002 Mar 1

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Fingerprint Dive into the research topics of 'Microhardness and lattice parameter of Cr<sub>1-x</sub>Al<sub>x</sub>N films'. Together they form a unique fingerprint.

Cite this