Microhardness and lattice parameter of Cr1-xAlxN films

Masahiro Kawate, Ayako Kimura, Tetsuya Suzuki

Research output: Contribution to journalArticle

84 Citations (Scopus)

Abstract

Eight kinds of targets with differing Al contents were used to synthesize Cr1-xAlxN films by the arc ion plating (AIP) method. Investigation of microhardness, microstructures, and lattice parameters of films was done by changing x values and analyzed by x-ray diffraction (XRD) method and scanning electron microscopy (SEM). Cross-sectional SEM observation of films showed that for all Cr1-xAlxN films, deposited for 20 min, microstructure drastically changed between x = 0.6 and 0.7, and had similar thickness of 5 to 6 μm.

Original languageEnglish
Pages (from-to)569-571
Number of pages3
JournalJournal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films
Volume20
Issue number2
DOIs
Publication statusPublished - 2002 Mar

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Microhardness
microhardness
Lattice constants
lattice parameters
ion plating
microstructure
Microstructure
Scanning electron microscopy
scanning electron microscopy
Plating
x ray diffraction
arcs
Diffraction
Ions
X rays

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Surfaces and Interfaces
  • Physics and Astronomy (miscellaneous)

Cite this

Microhardness and lattice parameter of Cr1-xAlxN films. / Kawate, Masahiro; Kimura, Ayako; Suzuki, Tetsuya.

In: Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films, Vol. 20, No. 2, 03.2002, p. 569-571.

Research output: Contribution to journalArticle

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