Microhardness and structural analysis of (Ti,Al)N, (Ti,Cr)N, (Ti,Zr)N and (Ti,V)N films

Hiroyuki Hasegawa, Ayako Kimura, Tetsuya Suzuki

Research output: Contribution to journalArticle

72 Citations (Scopus)

Abstract

Binary (TiN, ZrN, CrN) and ternary (TiAlN, TiCrN, TiZrN, TiVN) films were prepared on cemented carbide by arc ion plating. The microhardness, lattice parameter and morphology of the films were examined by micro-Vickers testing, X-ray diffraction analysis, and cross-sectional scanning electron microscopy. Results showed that binary nitride films generally had smaller Vickers hardness than ternary nitride. The lattice parameter of the first two ternary nitrides were smaller than that of TiN, while that of the third ternary nitride was larger than that of TiN and smaller than that of ZrN. All but the TiCrN and TiVN films had smooth surfaces.

Original languageEnglish
Pages (from-to)1038-1040
Number of pages3
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume18
Issue number3
DOIs
Publication statusPublished - 2000 May 1

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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