Microscale patterning of single crystal diamond by thermochemical reaction between sidero-metal and diamond

Yuko Morofushi, Hajime Matsushita, Norihisa Miki

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

Single crystal diamond is expected to be a new material for not only micromachining tools, but also innovative microelectromechanical systems (MEMS). In this paper, we propose a new method for micro-patterning of bulk diamond by exploiting the thermochemical reaction between diamond and sidero-metals. We demonstrate the micro-patterning of single crystal diamond by annealing at temperatures from 1073 K to 1173 K after either micro-patterning nickel on the diamond or placing the diamond on a silicon substrate with a micro-patterned nickel layer. The nickel patterning, and thus the diamond patterning, can be conducted in a mass producible manner using photolithography. Etching rates greater than 0.2 μm/min were successfully achieved. The etching mechanisms were also experimentally elucidated, with oxygen playing a crucial role in the etching processes.

Original languageEnglish
Pages (from-to)490-495
Number of pages6
JournalPrecision Engineering
Volume35
Issue number3
DOIs
Publication statusPublished - 2011 Jul

Fingerprint

Diamonds
Single crystals
Metals
Etching
Nickel
Micromachining
Photolithography
MEMS
Annealing
Silicon
Oxygen
Substrates
Temperature

Keywords

  • Diamond
  • MEMS
  • Micromachining
  • Photolithography
  • Thermochemical reaction

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Microscale patterning of single crystal diamond by thermochemical reaction between sidero-metal and diamond. / Morofushi, Yuko; Matsushita, Hajime; Miki, Norihisa.

In: Precision Engineering, Vol. 35, No. 3, 07.2011, p. 490-495.

Research output: Contribution to journalArticle

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