TY - GEN
T1 - Microscale patterning of single crystal diamond using sidero-metal/diamond thermochemical reaction
AU - Morofushi, Yuko
AU - Matsushita, Hajime
AU - Miki, Norihisa
PY - 2010/8/30
Y1 - 2010/8/30
N2 - Single crystal diamond is expected to be a new material for not only micro machining tools but also innovative micro devices. In this paper, we demonstrate the micro-patterning of bulk diamond by exploiting thermochemical reaction between diamond and sidero-metals. We demonstrate micro-patterning of single crystal diamond by annealing at ∼1073 K after either micro-patterning nickel on the diamond or placing the diamond on a silicon substrate with a micro-patterned nickel layer. Etching rates ∼0.2μm/min were successfully achieved. We also experimentally elucidated the etching mechanisms and identified the dominant factors in the etching processes.
AB - Single crystal diamond is expected to be a new material for not only micro machining tools but also innovative micro devices. In this paper, we demonstrate the micro-patterning of bulk diamond by exploiting thermochemical reaction between diamond and sidero-metals. We demonstrate micro-patterning of single crystal diamond by annealing at ∼1073 K after either micro-patterning nickel on the diamond or placing the diamond on a silicon substrate with a micro-patterned nickel layer. Etching rates ∼0.2μm/min were successfully achieved. We also experimentally elucidated the etching mechanisms and identified the dominant factors in the etching processes.
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M3 - Conference contribution
AN - SCOPUS:77955968447
SN - 9781605111957
T3 - Materials Research Society Symposium Proceedings
SP - 179
EP - 184
BT - Microelectromechanical Systems - Materials and Devices III
T2 - 2009 MRS Fall Meeting
Y2 - 30 November 2009 through 4 December 2009
ER -