Abstract
(Ti,Cr,Al,Si)N films were deposited on WC and Si substrate by cathodic arc method with TiCrAlSi alloy cathodes. At lower (Al + Si) contents from 0.56 to 0.60, the crystal structure of (Ti,Cr,Al,Si)N had NaCl type cubic structure. With increasing (Al + Si) contents, the NaCl structure changed to a hexagonal structure. The maximum hardness of (Ti,Cr,Al,Si)N was 31 GPa at 0.56 of (Si + Al) contents. Corresponding with structural changes from NaCl to wurtzite, microhardness decreased down to 26 GPa. TEM photographs indicated that embedding Si atom was effective to decreased grain sizes of 5-10 nm. In this paper, relationships between microstructure and microhardness as a function of Si and Al contents are discussed based on the phase transformation, analyzed by X-ray diffraction method and transmission electron microscopy.
| Original language | English |
|---|---|
| Pages (from-to) | 5477-5480 |
| Number of pages | 4 |
| Journal | Surface and Coatings Technology |
| Volume | 201 |
| Issue number | 9-11 SPEC. ISS. |
| DOIs | |
| Publication status | Published - 2007 Feb 26 |
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Keywords
- (Ti,Cr,Al,Si)N
- Microhardness
- Microstructure
ASJC Scopus subject areas
- Surfaces, Coatings and Films
- Condensed Matter Physics
- Surfaces and Interfaces
Cite this
Microstructures of (Ti,Cr,Al,Si)N films synthesized by cathodic arc method. / Ichijo, K.; Hasegawa, H.; Suzuki, Tetsuya.
In: Surface and Coatings Technology, Vol. 201, No. 9-11 SPEC. ISS., 26.02.2007, p. 5477-5480.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Microstructures of (Ti,Cr,Al,Si)N films synthesized by cathodic arc method
AU - Ichijo, K.
AU - Hasegawa, H.
AU - Suzuki, Tetsuya
PY - 2007/2/26
Y1 - 2007/2/26
N2 - (Ti,Cr,Al,Si)N films were deposited on WC and Si substrate by cathodic arc method with TiCrAlSi alloy cathodes. At lower (Al + Si) contents from 0.56 to 0.60, the crystal structure of (Ti,Cr,Al,Si)N had NaCl type cubic structure. With increasing (Al + Si) contents, the NaCl structure changed to a hexagonal structure. The maximum hardness of (Ti,Cr,Al,Si)N was 31 GPa at 0.56 of (Si + Al) contents. Corresponding with structural changes from NaCl to wurtzite, microhardness decreased down to 26 GPa. TEM photographs indicated that embedding Si atom was effective to decreased grain sizes of 5-10 nm. In this paper, relationships between microstructure and microhardness as a function of Si and Al contents are discussed based on the phase transformation, analyzed by X-ray diffraction method and transmission electron microscopy.
AB - (Ti,Cr,Al,Si)N films were deposited on WC and Si substrate by cathodic arc method with TiCrAlSi alloy cathodes. At lower (Al + Si) contents from 0.56 to 0.60, the crystal structure of (Ti,Cr,Al,Si)N had NaCl type cubic structure. With increasing (Al + Si) contents, the NaCl structure changed to a hexagonal structure. The maximum hardness of (Ti,Cr,Al,Si)N was 31 GPa at 0.56 of (Si + Al) contents. Corresponding with structural changes from NaCl to wurtzite, microhardness decreased down to 26 GPa. TEM photographs indicated that embedding Si atom was effective to decreased grain sizes of 5-10 nm. In this paper, relationships between microstructure and microhardness as a function of Si and Al contents are discussed based on the phase transformation, analyzed by X-ray diffraction method and transmission electron microscopy.
KW - (Ti,Cr,Al,Si)N
KW - Microhardness
KW - Microstructure
UR - http://www.scopus.com/inward/record.url?scp=33846514590&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=33846514590&partnerID=8YFLogxK
U2 - 10.1016/j.surfcoat.2006.07.016
DO - 10.1016/j.surfcoat.2006.07.016
M3 - Article
AN - SCOPUS:33846514590
VL - 201
SP - 5477
EP - 5480
JO - Surface and Coatings Technology
JF - Surface and Coatings Technology
SN - 0257-8972
IS - 9-11 SPEC. ISS.
ER -