Modeling of the influence of dielectric target on interface sheath characteristics in a radio-frequency magnetron sputtering

Shunji Kuroiwa; Teruyuki Mine; Takashi Yagisawa; Toshiaki Makabe

doi:10.1116/1.2009771

Modeling of the influence of dielectric target on interface sheath characteristics in a radio-frequency magnetron sputtering

Shunji Kuroiwa, Teruyuki Mine, Takashi Yagisawa, Toshiaki Makabe

Research output: Contribution to journal › Article › peer-review

7 Citations (Scopus)

Abstract

The differences in the plasma structure and particularly in the sheath profile between metallic and dielectric targets in an rf magnetron plasma were investigated. A typical magnetron sputtering system driven at 13.56 MHz for both metallic and dielectric targets was numerically studied using a hybrid model. The magnet unit consisting of a pair of inner and outer magnets and a yoke behind the target, generated a ring shaped permanent magnetic field in the discharge space. The results show that marked double minima in the dielectric erosion profile was caused by the existence of the charging on the dielectric material during ion sputtering process.

Original language	English
Pages (from-to)	2218-2221
Number of pages	4
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	23
Issue number	5
DOIs	https://doi.org/10.1116/1.2009771
Publication status	Published - 2005
Externally published	Yes

ASJC Scopus subject areas

Condensed Matter Physics
Electrical and Electronic Engineering

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10.1116/1.2009771

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Modeling of the influence of dielectric target on interface sheath characteristics in a radio-frequency magnetron sputtering. / Kuroiwa, Shunji; Mine, Teruyuki; Yagisawa, Takashi et al.

In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 23, No. 5, 2005, p. 2218-2221.

Research output: Contribution to journal › Article › peer-review

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abstract = "The differences in the plasma structure and particularly in the sheath profile between metallic and dielectric targets in an rf magnetron plasma were investigated. A typical magnetron sputtering system driven at 13.56 MHz for both metallic and dielectric targets was numerically studied using a hybrid model. The magnet unit consisting of a pair of inner and outer magnets and a yoke behind the target, generated a ring shaped permanent magnetic field in the discharge space. The results show that marked double minima in the dielectric erosion profile was caused by the existence of the charging on the dielectric material during ion sputtering process.",

author = "Shunji Kuroiwa and Teruyuki Mine and Takashi Yagisawa and Toshiaki Makabe",

note = "Funding Information: This work was supported in part by a Grant in Aid for the 21st Century Center of Excellence for Optical and Electronic Device Technology for Access Networks from the Ministry of Education, Culture, Sports, Science, and Technology of Japan. One of the authors (S. K) is grateful to A. Itoh and Y. Tsugami for their technical discussions during the work.",

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AU - Kuroiwa, Shunji

AU - Mine, Teruyuki

AU - Yagisawa, Takashi

AU - Makabe, Toshiaki

N1 - Funding Information: This work was supported in part by a Grant in Aid for the 21st Century Center of Excellence for Optical and Electronic Device Technology for Access Networks from the Ministry of Education, Culture, Sports, Science, and Technology of Japan. One of the authors (S. K) is grateful to A. Itoh and Y. Tsugami for their technical discussions during the work.

PY - 2005

Y1 - 2005

N2 - The differences in the plasma structure and particularly in the sheath profile between metallic and dielectric targets in an rf magnetron plasma were investigated. A typical magnetron sputtering system driven at 13.56 MHz for both metallic and dielectric targets was numerically studied using a hybrid model. The magnet unit consisting of a pair of inner and outer magnets and a yoke behind the target, generated a ring shaped permanent magnetic field in the discharge space. The results show that marked double minima in the dielectric erosion profile was caused by the existence of the charging on the dielectric material during ion sputtering process.

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Modeling of the influence of dielectric target on interface sheath characteristics in a radio-frequency magnetron sputtering

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