Modeling of the influence of dielectric target on interface sheath characteristics in a radio-frequency magnetron sputtering

Shunji Kuroiwa, Teruyuki Mine, Takashi Yagisawa, Toshiaki Makabe

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

The differences in the plasma structure and particularly in the sheath profile between metallic and dielectric targets in an rf magnetron plasma were investigated. A typical magnetron sputtering system driven at 13.56 MHz for both metallic and dielectric targets was numerically studied using a hybrid model. The magnet unit consisting of a pair of inner and outer magnets and a yoke behind the target, generated a ring shaped permanent magnetic field in the discharge space. The results show that marked double minima in the dielectric erosion profile was caused by the existence of the charging on the dielectric material during ion sputtering process.

Original languageEnglish
Pages (from-to)2218-2221
Number of pages4
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume23
Issue number5
DOIs
Publication statusPublished - 2005

Fingerprint

sheaths
Magnetron sputtering
radio frequencies
magnetron sputtering
Magnets
magnets
Plasma sheaths
Plasmas
profiles
erosion
Sputtering
charging
Erosion
sputtering
Magnetic fields
rings
Ions
magnetic fields
ions

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Surfaces and Interfaces
  • Physics and Astronomy (miscellaneous)

Cite this

Modeling of the influence of dielectric target on interface sheath characteristics in a radio-frequency magnetron sputtering. / Kuroiwa, Shunji; Mine, Teruyuki; Yagisawa, Takashi; Makabe, Toshiaki.

In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 23, No. 5, 2005, p. 2218-2221.

Research output: Contribution to journalArticle

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