Modification and densification of sol-gel derived silica films at low temperatures

Hiroaki Imai, Hiroshi Hirashima, Koichi Awazu, Hideo Onuki

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

Relatively new modification methods for densification of sol-gel derived silica films using electronic excitations and water vapor were investigated. Dried silica gel films were found to be densified by vacuum ultraviolet irradiation and He+ ion implantation. The densification is deduced to be ascribed to dehydration and cleavage of the strained bonds through electronic excitations induced by the irradiations. The structure of the irradiated silica films is similar to that of silica glass densified under a high pressure. The exposure to water vapor at 80° -180°C is also effective in densification and dehydration of sol-gel silica films. These methods are expected to be valuable for fabrication of dense silica films at low temperatures. However, the silica films densified by the irradiations and the exposure are suggested to contain a strained network because a subsequent annealing above 300°C induced structural changes through a thermal relaxation.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsB.S. Dunn, E.J.A. Pope, H.K. Schmidt, M. Yamane
Pages144-149
Number of pages6
Volume3136
DOIs
Publication statusPublished - 1997
EventSol-Gel Optics IV - San Diego, CA, United States
Duration: 1997 Jul 301997 Aug 1

Other

OtherSol-Gel Optics IV
CountryUnited States
CitySan Diego, CA
Period97/7/3097/8/1

Fingerprint

densification
Densification
Sol-gels
Silica
gels
silicon dioxide
Irradiation
silica gel
Dehydration
dehydration
Temperature
Water vapor
irradiation
water vapor
silica glass
Silica gel
Fused silica
electronics
Ion implantation
excitation

Keywords

  • Ion implantation
  • Low temperature densification
  • Silica gel
  • Thin films
  • Ultraviolet irradiation
  • Water vapor

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

Cite this

Imai, H., Hirashima, H., Awazu, K., & Onuki, H. (1997). Modification and densification of sol-gel derived silica films at low temperatures. In B. S. Dunn, E. J. A. Pope, H. K. Schmidt, & M. Yamane (Eds.), Proceedings of SPIE - The International Society for Optical Engineering (Vol. 3136, pp. 144-149) https://doi.org/10.1117/12.279157

Modification and densification of sol-gel derived silica films at low temperatures. / Imai, Hiroaki; Hirashima, Hiroshi; Awazu, Koichi; Onuki, Hideo.

Proceedings of SPIE - The International Society for Optical Engineering. ed. / B.S. Dunn; E.J.A. Pope; H.K. Schmidt; M. Yamane. Vol. 3136 1997. p. 144-149.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Imai, H, Hirashima, H, Awazu, K & Onuki, H 1997, Modification and densification of sol-gel derived silica films at low temperatures. in BS Dunn, EJA Pope, HK Schmidt & M Yamane (eds), Proceedings of SPIE - The International Society for Optical Engineering. vol. 3136, pp. 144-149, Sol-Gel Optics IV, San Diego, CA, United States, 97/7/30. https://doi.org/10.1117/12.279157
Imai H, Hirashima H, Awazu K, Onuki H. Modification and densification of sol-gel derived silica films at low temperatures. In Dunn BS, Pope EJA, Schmidt HK, Yamane M, editors, Proceedings of SPIE - The International Society for Optical Engineering. Vol. 3136. 1997. p. 144-149 https://doi.org/10.1117/12.279157
Imai, Hiroaki ; Hirashima, Hiroshi ; Awazu, Koichi ; Onuki, Hideo. / Modification and densification of sol-gel derived silica films at low temperatures. Proceedings of SPIE - The International Society for Optical Engineering. editor / B.S. Dunn ; E.J.A. Pope ; H.K. Schmidt ; M. Yamane. Vol. 3136 1997. pp. 144-149
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