Abstract
Understanding of magnetization process in patterned thin films is important for their applications in downsizing various magnetic devices. This paper deals with an experimental technique which enables us to characterize magnetization process in the ends of patterned ultra-thin films. In this study, only the top layer of magnetic sandwich structures were patterned into an array of fine magnetic particles using electron beam lithography and Ar ion milling to form relief structures in the films. The magnetization process of the arrays was inferred from magnetoresistance (MR) measurements of the films. MR behaviors of particle array samples of substrate/FM1/Cu/FM2 (FM1, FM2 = Co, NiFe, CoPt) in different pattern widths of ω = 0.2 and 0.6 μm, lengths L ranging from 0.2 to 280 μm and thicknesses of t = 6 and 18 nm were studied. From longitudinal MR measurements, a distinct decrease in remanent magnetization was found for sub-μm particle arrays, which may be associated with the formation of edge domains in the particles.
| Original language | English |
|---|---|
| Pages (from-to) | 2114-2116 |
| Number of pages | 3 |
| Journal | IEEE Transactions on Magnetics |
| Volume | 37 |
| Issue number | 4 I |
| DOIs | |
| Publication status | Published - 2001 Jul |
| Externally published | Yes |
Fingerprint
Keywords
- EB lithography
- Magnetic domain
- Magnetization reversal
- Spin valve
ASJC Scopus subject areas
- Electrical and Electronic Engineering
- Physics and Astronomy (miscellaneous)
Cite this
MR measurement of sub-micron scale relief structures fabricated in GMR materials. / Matsuyama, K.; Nozaki, Yukio; Misumi, T.
In: IEEE Transactions on Magnetics, Vol. 37, No. 4 I, 07.2001, p. 2114-2116.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - MR measurement of sub-micron scale relief structures fabricated in GMR materials
AU - Matsuyama, K.
AU - Nozaki, Yukio
AU - Misumi, T.
PY - 2001/7
Y1 - 2001/7
N2 - Understanding of magnetization process in patterned thin films is important for their applications in downsizing various magnetic devices. This paper deals with an experimental technique which enables us to characterize magnetization process in the ends of patterned ultra-thin films. In this study, only the top layer of magnetic sandwich structures were patterned into an array of fine magnetic particles using electron beam lithography and Ar ion milling to form relief structures in the films. The magnetization process of the arrays was inferred from magnetoresistance (MR) measurements of the films. MR behaviors of particle array samples of substrate/FM1/Cu/FM2 (FM1, FM2 = Co, NiFe, CoPt) in different pattern widths of ω = 0.2 and 0.6 μm, lengths L ranging from 0.2 to 280 μm and thicknesses of t = 6 and 18 nm were studied. From longitudinal MR measurements, a distinct decrease in remanent magnetization was found for sub-μm particle arrays, which may be associated with the formation of edge domains in the particles.
AB - Understanding of magnetization process in patterned thin films is important for their applications in downsizing various magnetic devices. This paper deals with an experimental technique which enables us to characterize magnetization process in the ends of patterned ultra-thin films. In this study, only the top layer of magnetic sandwich structures were patterned into an array of fine magnetic particles using electron beam lithography and Ar ion milling to form relief structures in the films. The magnetization process of the arrays was inferred from magnetoresistance (MR) measurements of the films. MR behaviors of particle array samples of substrate/FM1/Cu/FM2 (FM1, FM2 = Co, NiFe, CoPt) in different pattern widths of ω = 0.2 and 0.6 μm, lengths L ranging from 0.2 to 280 μm and thicknesses of t = 6 and 18 nm were studied. From longitudinal MR measurements, a distinct decrease in remanent magnetization was found for sub-μm particle arrays, which may be associated with the formation of edge domains in the particles.
KW - EB lithography
KW - Magnetic domain
KW - Magnetization reversal
KW - Spin valve
UR - http://www.scopus.com/inward/record.url?scp=0035385959&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0035385959&partnerID=8YFLogxK
U2 - 10.1109/20.951070
DO - 10.1109/20.951070
M3 - Article
AN - SCOPUS:0035385959
VL - 37
SP - 2114
EP - 2116
JO - IEEE Transactions on Magnetics
JF - IEEE Transactions on Magnetics
SN - 0018-9464
IS - 4 I
ER -