Multidirectional UV lithography via inclined/rotated mirrors for liquid materials

Takumi Sugimito, Hidetoshi Takahashi

Research output: Contribution to journalArticle

Abstract

This letter presents the development of an exposure equipment for inclined/rotating lithography with UV curable liquid materials. The proposed equipment is composed of inclined mirrors rotating around exposure spot and shading plate to prevent direct vertical irradiated UV light. UV light ray is reflected on the mirrors, and irradiate to the spot with inclined angle via rotation. During mirrors rotating, UV curable material located on the exposure spot keeps a quiet state. The incident angle of UV light ray is controllable by changing the mirror inclination. We developed an equipment and conducted an experiment for the fabrication of 3D structures with PEGDA.

Original languageEnglish
Article number076502
JournalApplied Physics Express
Volume13
Issue number7
DOIs
Publication statusPublished - 2020 Jul 1

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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