Nano-structure Ge formed in thin film SiO2 using ion implantation

J. R. Phillips, Olof C. Hellman, N. Kobayashi, Yunosuke Makita, Hajime Shibata, A. Yamada, P. Fons, Yushin Tsai, Shigeru Niki, Masataka Hasegawa, Tsutomu Iida

Research output: Chapter in Book/Report/Conference proceedingConference contribution

6 Citations (Scopus)

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