For plasmonic surface optical applications, localized optical field distribution properties in the vicinity of gold particles on a silicon substrate by backward and forward irradiation are presented. It is technically difficult to fabricate nanostructure on the surface by conventional forward laser incidence to the substrate because gold nanoparticles easily aggregate to form double-layered particle arrays. We calculated enhanced optical field properties in order to pattern the substrate surface only with a template of the bottom-layered particle arrays in case that the backward irradiation of femtosecond laser is used in the system of aggregated double-layered gold nanoparticle arrays. With the backward irradiation, the optical field intensity in the substrate for the double-layered hexagonal arrays is found to be only 30% lower than the mono-layered system. Moreover, near-field cannot be generated with the forward irradiation. As a result, only the backward irradiation scheme is found to be effective for uniform surface nanopatterning at enhanced plasmonic near-field zones.