Abstract
Summary form only given. Polarization-sensitive imaging using near-field scanning optical microscopy (NSOM) is a fundamental method for the magneto-optical study of micro-structures. The polarization NSOM also offers another contrast mechanism based on the depolarization effect due to the near-field tip-sample interaction. For achievement of higher resolution and application to opaque materials, internal-reflection NSOM (IR-NSOM) with an aperture probe is the most promising technique. Here, we demonstrate the operation of IR-NSOM through the investigation of phase-change recording media. By obtaining background suppression as high as 10-5, amorphous marks are clearly imaged with an optical contrast higher than that in conventional far-field configuration.
Original language | English |
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Title of host publication | Technical Digest - Summaries of Papers Presented at the Quantum Electronics and Laser Science Conference, QELS 2001 |
Publisher | Institute of Electrical and Electronics Engineers Inc. |
Pages | 80 |
Number of pages | 1 |
ISBN (Print) | 155752663X, 9781557526632 |
DOIs | |
Publication status | Published - 2001 |
Externally published | Yes |
Event | Quantum Electronics and Laser Science Conference, QELS 2001 - Baltimore, United States Duration: 2001 May 6 → 2001 May 11 |
Other
Other | Quantum Electronics and Laser Science Conference, QELS 2001 |
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Country | United States |
City | Baltimore |
Period | 01/5/6 → 01/5/11 |
ASJC Scopus subject areas
- Electrical and Electronic Engineering
- Radiation