Near-field optical polarization microscopy in internal-reflection configuration with ultrasmall aperture probe

Toshiharu Saiki

doi:10.1109/QELS.2001.961882

Near-field optical polarization microscopy in internal-reflection configuration with ultrasmall aperture probe

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

Summary form only given. Polarization-sensitive imaging using near-field scanning optical microscopy (NSOM) is a fundamental method for the magneto-optical study of micro-structures. The polarization NSOM also offers another contrast mechanism based on the depolarization effect due to the near-field tip-sample interaction. For achievement of higher resolution and application to opaque materials, internal-reflection NSOM (IR-NSOM) with an aperture probe is the most promising technique. Here, we demonstrate the operation of IR-NSOM through the investigation of phase-change recording media. By obtaining background suppression as high as 10^-5, amorphous marks are clearly imaged with an optical contrast higher than that in conventional far-field configuration.

Original language	English
Title of host publication	Technical Digest - Summaries of Papers Presented at the Quantum Electronics and Laser Science Conference, QELS 2001
Publisher	Institute of Electrical and Electronics Engineers Inc.
Pages	80
Number of pages	1
ISBN (Print)	155752663X, 9781557526632
DOIs	https://doi.org/10.1109/QELS.2001.961882
Publication status	Published - 2001
Externally published	Yes
Event	Quantum Electronics and Laser Science Conference, QELS 2001 - Baltimore, United States Duration: 2001 May 6 → 2001 May 11

Other

Other	Quantum Electronics and Laser Science Conference, QELS 2001
Country	United States
City	Baltimore
Period	01/5/6 → 01/5/11

ASJC Scopus subject areas

Electrical and Electronic Engineering
Radiation

Access to Document

10.1109/QELS.2001.961882

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Cite this

Saiki, T. (2001). Near-field optical polarization microscopy in internal-reflection configuration with ultrasmall aperture probe. In Technical Digest - Summaries of Papers Presented at the Quantum Electronics and Laser Science Conference, QELS 2001 (pp. 80). [961882] Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/QELS.2001.961882

Near-field optical polarization microscopy in internal-reflection configuration with ultrasmall aperture probe. / Saiki, Toshiharu.

Technical Digest - Summaries of Papers Presented at the Quantum Electronics and Laser Science Conference, QELS 2001. Institute of Electrical and Electronics Engineers Inc., 2001. p. 80 961882.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Saiki, T 2001, Near-field optical polarization microscopy in internal-reflection configuration with ultrasmall aperture probe. in Technical Digest - Summaries of Papers Presented at the Quantum Electronics and Laser Science Conference, QELS 2001., 961882, Institute of Electrical and Electronics Engineers Inc., pp. 80, Quantum Electronics and Laser Science Conference, QELS 2001, Baltimore, United States, 01/5/6. https://doi.org/10.1109/QELS.2001.961882

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abstract = "Summary form only given. Polarization-sensitive imaging using near-field scanning optical microscopy (NSOM) is a fundamental method for the magneto-optical study of micro-structures. The polarization NSOM also offers another contrast mechanism based on the depolarization effect due to the near-field tip-sample interaction. For achievement of higher resolution and application to opaque materials, internal-reflection NSOM (IR-NSOM) with an aperture probe is the most promising technique. Here, we demonstrate the operation of IR-NSOM through the investigation of phase-change recording media. By obtaining background suppression as high as 10-5, amorphous marks are clearly imaged with an optical contrast higher than that in conventional far-field configuration.",

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