Near-field optical polarization microscopy in internal-reflection configuration with ultrasmall aperture probe

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Summary form only given. Polarization-sensitive imaging using near-field scanning optical microscopy (NSOM) is a fundamental method for the magneto-optical study of micro-structures. The polarization NSOM also offers another contrast mechanism based on the depolarization effect due to the near-field tip-sample interaction. For achievement of higher resolution and application to opaque materials, internal-reflection NSOM (IR-NSOM) with an aperture probe is the most promising technique. Here, we demonstrate the operation of IR-NSOM through the investigation of phase-change recording media. By obtaining background suppression as high as 10-5, amorphous marks are clearly imaged with an optical contrast higher than that in conventional far-field configuration.

Original languageEnglish
Title of host publicationTechnical Digest - Summaries of Papers Presented at the Quantum Electronics and Laser Science Conference, QELS 2001
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages80
Number of pages1
ISBN (Electronic)155752663X, 9781557526632
DOIs
Publication statusPublished - 2001
Externally publishedYes
EventQuantum Electronics and Laser Science Conference, QELS 2001 - Baltimore, United States
Duration: 2001 May 62001 May 11

Publication series

NameTechnical Digest - Summaries of Papers Presented at the Quantum Electronics and Laser Science Conference, QELS 2001

Other

OtherQuantum Electronics and Laser Science Conference, QELS 2001
Country/TerritoryUnited States
CityBaltimore
Period01/5/601/5/11

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Radiation

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