Near-field-optical-probe induced resistance-change-detection (NF-OBIRCH) method for identifying defects in Al and TiSi interconnects

K. Nikawa; T. Saiki; S. Inoue; M. Ohtsu

doi:10.1016/S0026-2714(98)00100-0

Near-field-optical-probe induced resistance-change-detection (NF-OBIRCH) method for identifying defects in Al and TiSi interconnects

K. Nikawa, T. Saiki, S. Inoue, M. Ohtsu

Research output: Contribution to journal › Article › peer-review

Abstract

The optical-beam-induced resistance-change-detection (OBIRCH) method has been improved by using a near-field optical probe as the heat source instead of a laser beam. The resulting NF-OBIRCH method has two advantages over the conventional OBIRCH method. (1) Its spatial resolution is higher. (2) The optical-beam-induced resistance change caused by heating can be observed when the aperture size is zero without interference from the photo current caused by electron-hole-pair generation. In the conventional OBIRCH method, the laser beam creates not only the resistance change, but also the photo current that can mask the resistance change signals.

Original language	English
Pages (from-to)	883-888
Number of pages	6
Journal	Microelectronics Reliability
Volume	38
Issue number	6-8
DOIs	https://doi.org/10.1016/S0026-2714(98)00100-0
Publication status	Published - 1998
Externally published	Yes

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Safety, Risk, Reliability and Quality
Surfaces, Coatings and Films
Electrical and Electronic Engineering

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10.1016/S0026-2714(98)00100-0

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@article{92e7a9bd160341dcb40e397623ae1ea1,

title = "Near-field-optical-probe induced resistance-change-detection (NF-OBIRCH) method for identifying defects in Al and TiSi interconnects",

abstract = "The optical-beam-induced resistance-change-detection (OBIRCH) method has been improved by using a near-field optical probe as the heat source instead of a laser beam. The resulting NF-OBIRCH method has two advantages over the conventional OBIRCH method. (1) Its spatial resolution is higher. (2) The optical-beam-induced resistance change caused by heating can be observed when the aperture size is zero without interference from the photo current caused by electron-hole-pair generation. In the conventional OBIRCH method, the laser beam creates not only the resistance change, but also the photo current that can mask the resistance change signals.",

author = "K. Nikawa and T. Saiki and S. Inoue and M. Ohtsu",

year = "1998",

doi = "10.1016/S0026-2714(98)00100-0",

language = "English",

volume = "38",

pages = "883--888",

journal = "Microelectronics and Reliability",

issn = "0026-2714",

publisher = "Elsevier Limited",

number = "6-8",

}

TY - JOUR

T1 - Near-field-optical-probe induced resistance-change-detection (NF-OBIRCH) method for identifying defects in Al and TiSi interconnects

AU - Nikawa, K.

AU - Saiki, T.

AU - Inoue, S.

AU - Ohtsu, M.

PY - 1998

Y1 - 1998

N2 - The optical-beam-induced resistance-change-detection (OBIRCH) method has been improved by using a near-field optical probe as the heat source instead of a laser beam. The resulting NF-OBIRCH method has two advantages over the conventional OBIRCH method. (1) Its spatial resolution is higher. (2) The optical-beam-induced resistance change caused by heating can be observed when the aperture size is zero without interference from the photo current caused by electron-hole-pair generation. In the conventional OBIRCH method, the laser beam creates not only the resistance change, but also the photo current that can mask the resistance change signals.

AB - The optical-beam-induced resistance-change-detection (OBIRCH) method has been improved by using a near-field optical probe as the heat source instead of a laser beam. The resulting NF-OBIRCH method has two advantages over the conventional OBIRCH method. (1) Its spatial resolution is higher. (2) The optical-beam-induced resistance change caused by heating can be observed when the aperture size is zero without interference from the photo current caused by electron-hole-pair generation. In the conventional OBIRCH method, the laser beam creates not only the resistance change, but also the photo current that can mask the resistance change signals.

UR - http://www.scopus.com/inward/record.url?scp=0032083877&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0032083877&partnerID=8YFLogxK

U2 - 10.1016/S0026-2714(98)00100-0

DO - 10.1016/S0026-2714(98)00100-0

M3 - Article

AN - SCOPUS:0032083877

SN - 0026-2714

VL - 38

SP - 883

EP - 888

JO - Microelectronics and Reliability

JF - Microelectronics and Reliability

IS - 6-8

ER -

Near-field-optical-probe induced resistance-change-detection (NF-OBIRCH) method for identifying defects in Al and TiSi interconnects

Abstract

ASJC Scopus subject areas

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